Microstructure of ion-implanted region in TiNi alloy |
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| Authors: | Noriaki Ikenaga Yoichi Kishi Zenjiro Yajima Noriyuki Sakudo Shizuka Nakano Hisato Ogiso |
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| Affiliation: | 1. Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology, 3-1 Yatsukaho, Hakusan, Ishikawa 924-0838, Japan;2. Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan |
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| Abstract: | TiNi alloy samples implanted with various fluences of 3 MeV Cu2+ ions were characterized by transmission electron microscope (TEM) and X-ray diffractometer. Cross-sectional TEM images of the samples showed that amorphous region was seen at the fluence of 1014 ions cm?2 in case of ion implantation at 300 K of the substrate temperature, but in case of ion implantation at 100 K it did not appear even at 1015 ions cm?2. These results were also confirmed by X-ray diffraction profiles of the same samples. Consequently, the extent of microstructure change of TiNi alloy by ion implantation was different depending on the substrate temperature. |
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