| 原子力显微镜在PLD法制备ZnO薄膜表征中的应用 |
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| 引用本文： | 李丽丽,梁齐,仇旭升,汪壮兵,宣晓峰,于永强.原子力显微镜在PLD法制备ZnO薄膜表征中的应用[J].发光学报,2009,30(1):63-68. |
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| 作者姓名： | 李丽丽 梁齐 仇旭升 汪壮兵 宣晓峰 于永强 |
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| 作者单位： | 合肥工业大学 应用物理系, 安徽 合肥 230009 |
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| 基金项目： | 教育部留学归国人员实验室建设项目资助(新型微电子学薄膜研究室) |
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| 摘 要： | 利用脉冲激光沉积(PLD)法在氧压为16 Pa、衬底温度为400~700 ℃时,在单晶Si(100) 衬底上制备ZnO薄膜,并通过原子力显微镜(AFM)、X射线衍射(XRD)谱和光致发光谱对制得的薄膜样品进行表面形貌、结构特性和发光性质研究。其中通过原子力显微镜对样品的二维、三维以及剖面线图进行了分析。结果表明衬底温度700 ℃时得到的薄膜样品表面较均匀致密,晶粒生长较充分,结晶质量较高,相对发光强度高。控制氧压为5.7 Pa,在衬底温度为600 ℃,沉积时间分别为10,20,45 min制备ZnO薄膜样品;利用原子力显微镜对样品进行表面形貌观察,得知只有沉积时间足够长才能使薄膜表面晶粒充分生长。
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| 关 键 词： | ZnO薄膜 脉冲激光沉积 原子力显微镜 X射线衍射 光致发光 |
| 收稿时间： | 2008-07-17 |
Application of Atomic Force Microscope in the Characterization of ZnO Thin Films Fabricated by Pulsed Laser Deposition |
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| LI Li-li,LIANG Qi,QIU Xu-sheng,WANG Zhuang-bing,XUAN Xiao-feng,YU Yong-qiang.Application of Atomic Force Microscope in the Characterization of ZnO Thin Films Fabricated by Pulsed Laser Deposition[J].Chinese Journal of Luminescence,2009,30(1):63-68. |
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| Authors: | LI Li-li LIANG Qi QIU Xu-sheng WANG Zhuang-bing XUAN Xiao-feng YU Yong-qiang |
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| Affiliation: | Department of Applied Physics, Hefei University of Technology, Hefei 230009, China |
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| Abstract: | Zinc oxide,which is a direct wide band-gap(3.37 eV) compound semiconductor with the large exciton binding energy(60 meV),has recently become a very popular material due to its good photoelectric and piezoelectric properties.Besides,the pulsed laser deposition(PLD) technique has its unique advantages such as high controllability of film composition,the easy control of experimental parameters and an inherently clean process which make it easy to deposit high-quality complex compound films.The dependence of th... |
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| Keywords: | ZnO thin film PLD AFM XRD photoluminescence |
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