| 循环氩离子轰击-等离子体增强化学气相沉积 TiN 膜组织与性能研究 |
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| 引用本文： | 谢飞,袁军伟,何家文.循环氩离子轰击-等离子体增强化学气相沉积 TiN 膜组织与性能研究[J].兵器材料科学与工程,1998(1). |
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| 作者姓名： | 谢飞 袁军伟 何家文 |
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| 作者单位： | 西安交通大学金属材料强度国家重点实验室 |
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| 摘 要： | 分析对比了常规ＰＥＣＶＤＴｉＮ膜与循环氩离子轰击－ＰＥＣＶＤＴｉＮ膜组织与性能的差异。结果表明，循环氩离子轰击－ＰＥＣＶＤＴｉＮ膜较之常规ＰＥＣＶＤＴｉＮ膜，其组织细小致密，膜内残余氯含量显著降低，膜的硬度与耐磨性提高，但膜－基体结合强度没有显著改变。
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| 关 键 词： | PECVD TiN 循环Ar~＋轰击 组织 性能 |
STRUCTURE AND PROPERTIES OF REPEATED Ar + BOMBARDMENT-PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION(PECVD) TiN FILMS |
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| Xie Fei,Yuan Junwei,He Jiawen.STRUCTURE AND PROPERTIES OF REPEATED Ar + BOMBARDMENT-PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION(PECVD) TiN FILMS[J].Ordnance Material Science and Engineering,1998(1). |
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| Authors: | Xie Fei Yuan Junwei He Jiawen |
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| Abstract: | The structure and properties of conventional PECVD TiN films and repeated Ar + bombardment-PECVD TiN films have been investigated. Compared with the conventional PECVD TiN films, the repeated Ar + bombardment-PECVD TiN films , structure is finer and denser, the residual chlorine in the films is significantly reduced, the hardness and wear resistance are increased, but the bonding strength between the films and substrates is not much improved. |
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| Keywords: | PECVD TiN repeated Ar + bombardment structure property |
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