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晶体硅太阳电池减反射膜的研究
引用本文:秦尤敏,高华,张剑.晶体硅太阳电池减反射膜的研究[J].上海有色金属,2011,32(4):179-181,191.
作者姓名:秦尤敏  高华  张剑
作者单位:上海超日太阳能科技股份有限公司,上海,201406
摘    要:为了提高晶体硅太阳能电池的光电转换效率,以及获得较佳的减反射膜的膜厚和折射率,根据计算得出的在波长为600 nm的太阳光下减反射膜的膜厚和折射率的最佳理论值,设计了三组等离子体增强化学气相沉积工艺(1#,2#和3#工艺),来制备不同膜厚和折射率的SiNx∶H(氮化硅)减反射膜.实验结果显示:1#工艺对应的膜厚为83 n...

关 键 词:晶体硅  转换效率  等离子体增强  化学气相沉积  SiNx:H  减反射膜

Investigation on Anti-reflection Film of Crystalline Silicon Solar Cells
QIN You-min,GAO Hua,ZHANG Jian.Investigation on Anti-reflection Film of Crystalline Silicon Solar Cells[J].Shanghai Nonferrous Metals,2011,32(4):179-181,191.
Authors:QIN You-min  GAO Hua  ZHANG Jian
Affiliation:(Shanghai Chaori Solar Energy Science &Technology Co., Ltd., Shanghai 201406, China)
Abstract:In order to improve the crystalline silicon solar cells photoelectric conversion efficiency and obtain the antireflection coating with the better thickness and refractive index, three groups of craft (1#, 2# and 3#) were designed. Antireflection coatings were prepared with different thickness and refractive index using plasma enhanced chemical vapor deposition, according to the best theoretical calculation value of thickness and the index of refraction at the wavelength of 600 nm. The results show that the thickness of 1# is 83 nm, refractive index is 2.01; the thickness of 2# is 75 nm, refractive index is 2.01 ; and the thickness of 3# is 66 nm, refractive index is 2.02. The conversion efficiency of 1# is 18.00%, the conversion efficiency of 2# is 18.08%, and the conversion efficiency 3# is 17.99%. The deposition craft of 2 # was better than other two under current production situations.
Keywords:crystalline silicon  conversion efficiency  plasma enhanced  chemical vapor deposition  SiNx: H  anti-reflection coating
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