纳米金刚石膜真空窗口的制备

使用自制的微波等离子体化学气相沉积装置，以乙醇为碳源在（100）硅表面制备了金刚石膜；然后用浓硝酸和氢氟酸的混合溶液腐蚀硅，制备出金刚石膜窗口。使用场发射扫描电镜（SEM）、X射线衍射、拉曼光谱（Raman）、原子力显微镜（AFM）表征和分析金刚石膜，并以自制的漏气率测量系统测量金刚石膜窗口的漏气率。结果表明:金刚石膜的厚度为15 μm，平均粗糙度值R_a为39.5 nm，晶粒的尺寸大小为30 nm，漏气率为8.8×10-9 Pa·m3/s。 

Preparation of nanocrystalline diamond film vacuum window

A new nanocrystalline diamond film is prepared in C₂H₆O/H₂ using self-made microwave plasma chemical vapor deposition(MPCVD)system.The nanocrystalline diamond film is deposited on the surface of(100)-oriented Si wafer.Then a nanocrystalline diamond vacuum window is achieved after the silicon wafer is corroded by a mixture of nitric acid and hydrofluoric acid.The morphology,grain size,microstructure,orientation or texture,and crystalline quality of the diamond samples are characterized by scanning electron microscopy(SEM),X-ray diffraction,micro-Raman spectroscopy,and atomic force microscopy(AFM).The final window has a thickness of 15 μm,with surface roughness of R_a 39.5 nm and grain size of 30 nm.According to self-made leakage rate system,the air leakage rate of this vacuum window is 8.8×10-9 Pa·m3/s.