| 双层辉光离子渗镀钽 |
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| 引用本文： | 高原,黄旭.双层辉光离子渗镀钽[J].材料科学与工艺,1997,5(3):105-108. |
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| 作者姓名： | 高原 黄旭 |
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| 作者单位： | 太原工业大学表面工程研究所!030024(高原)，太原工业大学表面工程研究所(黄旭，范本惠，徐重) |
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| 摘 要： | 介绍了一种新型离子渗镀钽的工艺方法。较好解决了渗镀钽时供给活性钽粒子的总是比方法工艺简单，操作方便，效率高。为充分利用和节约使用昂贵的钽探索了一条实用可行的途径。
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| 关 键 词： | 渗钽 阴极溅射 辉光放电 金属钽 |
Research on Diffusion and Depositing Tantalum Compound Technique by Xu-TEC Proless |
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| Gao Yuan, Huang Xu, Fan Benghuei, Xu zhong.Research on Diffusion and Depositing Tantalum Compound Technique by Xu-TEC Proless[J].Materials Science and Technology,1997,5(3):105-108. |
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| Authors: | Gao Yuan Huang Xu Fan Benghuei Xu zhong |
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| Affiliation: | Tai yuan University of Technology |
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| Abstract: | This paper deals with a new tanlalumizing method, which has solved the problem ofproviding living tantalum atoms in tantalumizing This method features simple process, easyoperation and high efficiency. It is a good way to make full use of tantalum. |
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| Keywords: | Tantalumizing sputter glow discharge |
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