| 溅射制备ZnS:Er~(3+)薄膜的光电子发射结构 |
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| 引用本文： | 柳兆,王余姜,陈谋智,纪安妮,邓彩玲. 溅射制备ZnS:Er~(3+)薄膜的光电子发射结构[J]. 微纳电子技术, 1998, 0(4) |
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| 作者姓名： | 柳兆 王余姜 陈谋智 纪安妮 邓彩玲 |
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| 作者单位： | 厦门大学物理系 |
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| 摘 要： | 利用射频磁控溅射法制备掺铒硫化锌直流电致发光薄膜，用ＸＰＳ（ｘ射线光电子能谱）技术进行剖析，获得薄膜内部构态与发光性能关系的信息，讨论了微晶薄膜中稀土掺杂状态对激发机制的影响。
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| 关 键 词： | 电致发光薄膜 射频磁控溅射 x射线光电子能谱 |
Photoelectron Emissive Structures in ZnS:Er 3+ Thin Film Prepared by RF Magnetron Sputtering |
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| Liu Zhaohong,Wang Yujiang,Chen Mouzhi,Ji Anni,Deng Cailing. Photoelectron Emissive Structures in ZnS:Er 3+ Thin Film Prepared by RF Magnetron Sputtering[J]. Micronanoelectronic Technology, 1998, 0(4) |
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| Authors: | Liu Zhaohong Wang Yujiang Chen Mouzhi Ji Anni Deng Cailing |
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| Abstract: | The direct current electroluminescence thin film of zinc sulfide doped with erbium,prepared by radio frequency magnetron sputtering,was studied by x ray photoelectron spectroscopy.The information of electroluminescent characteristics dependance on internal states of the films is obtained.The influence of rare earth doping states in microcrystaline thin film on exciting mechanism are discussed as well. |
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| Keywords: | Direct current electroluminescence thin film Radio frequency magnetron sputtering(RFMS) x ray photoelectron spectroscopy(XPS) |
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