Lanthanum nickelate thin films deposited by spray pyrolysis: Crystallization,microstructure and electrochemical properties |
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| Authors: | Thomas Ryll Philipp Reibisch Lukas Schlagenhauf Anja Bieberle-Huetter Max Döbeli Jennifer L.M. Rupp Ludwig J. Gauckler |
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| Affiliation: | 1. Nonmetallic Inorganic Materials, Department of Materials, ETH Zurich, Wolfgang-Pauli-Strasse 10, 8093 Zurich, Switzerland;2. Laboratory of Ion Beam Physics, Department of Physics, ETH Zurich, Schafmattstrasse 20, 8093 Zurich, Switzerland;1. Materials Science and Engineering, University of Connecticut, Storrs, CT 06269, USA;2. Intel Corporation, Hillsboro, OR 97124, USA;3. Department of Mechanical and Materials Engineering, Florida International University, Miami, FL 33174, USA;4. Center for the Study of Matter at Extreme Conditions (CeSMEC), Florida International University, Miami, FL 33199, USA;5. Center for Clean Energy Engineering, University of Connecticut, Storrs, CT 06269, USA;1. Institute of Magnetism, 36b Vernadsky Ave., Kyiv 03142, Ukraine;2. Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and School of Physics, Trinity College Dublin, Dublin 2, Ireland;1. State Key Laboratory of Materials-Oriented Chemical Engineering and College of Science, Nanjing Tech University, Nanjing 210009, People’s Republic of China;2. College of Materials Science and Engineering, Nanjing Tech University, Nanjing 210009, People’s Republic of China;3. State Key Laboratory of Coordination Chemistry, Nanjing University, Nanjing 210093, People’s Republic of China;1. Materials Science and Engineering Postgraduate Program, UFPB, 58051-900, João Pessoa, Brazil;2. Department of Materials Engineering, UFPB, João Pessoa 58051-900, Brazil;3. Department of Chemical Engineering, UFPB, João Pessoa 58051-900, Brazil;4. Department of Materials and Ceramic Engineering, University of Aveiro, Aveiro 3810-193, Portugal;5. Laboratoire CRISMAT ENSICAEN UMR CNRS 6508, 6 Boulevard du Maréchal Juin, 14050 Caen Cedex 04, France;1. School of Physics and CRANN, Trinity College, Dublin 2, Ireland;2. Department of Physics, Isfahan University of Technology, Isfahan 84156-8311, Iran |
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| Abstract: | Thin films from the Lan+1NinO3n+1 system exhibit favorable dielectric and electrochemical properties that may prove useful for a variety of devices ranging from ferroelectrics to low-temperature solid oxide fuel cells. The present work covers the compositional, microstructural and electrochemical characterization of thin lanthanum nickelate films deposited by spray pyrolysis. In accordance with the phase diagram, LaNiO3?δ or La4Ni3O10?δ films were obtained during annealing of spray deposited films at temperatures between 540 °C and 1100 °C. Whereas LaNiO3?δ films exhibited a high metallic conductivity, La4Ni3O10?δ films were semiconducting. Electrochemical impedance spectroscopy indicated an increase of the area specific oxygen reduction resistance with the annealing temperature. The study highlights how the phase and microstructure of thin films from the Lan+1NinO3n+1 system can be tailored by annealing of initially amorphous films. LaNiO3?δ films have a high potential for application in electrochemical devices operating at low temperatures where high electrical conductivity is required. |
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