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低压气相生长金刚石薄膜系统中衬底表面凹缺陷成核机制研究
引用本文:杨国伟.低压气相生长金刚石薄膜系统中衬底表面凹缺陷成核机制研究[J].高压物理学报,1994,8(3):229-236.
作者姓名:杨国伟
作者单位:洛阳航空航天部第014中心
摘    要: 提出了金刚石在衬底表面凹缺陷内成核的理论,指出凹缺陷尺度对于金刚石成核有着决定性作用,合适的凹缺陷将使成核率达到最大。并且讨论了该理论对于试图通过控制衬底表面缺陷来控制金刚石成核密度等人工微结构设计研究的意义。

关 键 词:金刚石薄膜  凹缺陷  成核
收稿时间:1993-07-03;

THE NUCLEATION MECHANISM OF SUBSTRATES SURFACE DEFECTS IN LOW PRESSURE VAPOR DEPOSITION OF DIAMOND THIN FILMS
Yang Guowei.THE NUCLEATION MECHANISM OF SUBSTRATES SURFACE DEFECTS IN LOW PRESSURE VAPOR DEPOSITION OF DIAMOND THIN FILMS[J].Chinese Journal of High Pressure Physics,1994,8(3):229-236.
Authors:Yang Guowei
Affiliation:No.014 Ministry of Aviation, Luoyang 471009, China
Abstract:To promote diamond nucleation density,introduction of defects on the substratesurface is an effective method in low pressure vapor deposition of diamond thin film growthing.However,little studies in this field have been made so far.Based on our experiments,we presentin the paper the diamond nucleation mechanisms of the groove defects on the substrate surface.The size of the groove defects is of key importance for the diamond nucleation:An approprite sizeof the groove defects can effectively promote the nucleation.Finally,we studied the significanceof the theory in the controlling of diamond nucleation density via the surface defects on the sub-strate.
Keywords:Diamond thin film  groove defect  nucleation  
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