X光光电子能谱法测定胶片中氟,硅和铝的研究

应用Ｘ光光电子能谱法测定了几种彩色胶片表面层中氟的１ｓ能级的结合能；分别比较了水处理前后、溅蚀前后胶片护膜层氟的变化，表明氟化物分布在护膜最表层，是一种易溶于水的氟化物；测定了彩色片护膜层所含硅２ｐ能级的结合能，与自制彩色片护膜层测定结果比较，优质片含一种较多负电性，用与自制片的无机硅不同的硅化物作毛面剂；对溅蚀前后优质片和自产彩色片中的硅铝比变化进行比较，提出优质彩色片Ｆ－４００的护膜层可能是双

STUDY ON THE DETERMINATION OF FLUORINE,SILICON AND ALUMINIUM IN FILMS BY X-RAY PHOTOELECTRON SPECTROSCOPY

In this paper, X-ray photoelectron spectroscopy is employed to determine the binding energy of fluorine's is energy level in some kind of colour film layers. The changes of fluorine content in layers are compared respectively before and after water treatment and sputtering etching, indicating that fluorine is distributed in the surface layer and can easily dissolve in water. The binding energy of silicon's 2p energy level in colour film layer is also determined, and compared with self-made colour film.It is shown that high-quality films use silicon compound as a matt agent, which has much negative electric properties , and is different to the inorganic silicon of self-made film. The Si/Al change in layers before and after sputtering etching is studied. The differences of the change of Si/Al in high-quality and selfmade colour films are also compared offering the possibility of a double protective-layer in high-quality colour film F-400.