Microstructure and Vickers hardness of Co/Cu multilayers fabricated by electrodeposition |
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Authors: | Y Kaneko H Sakakibara S Hashimoto |
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Affiliation: | (1) Department of Intelligent Materials Engineering, Faculty of Engineering, Osaka City University, Sugimoto 3-3-138, Sumiyoshi-ku, Osaka 558-8585, Japan |
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Abstract: | In order to investigate thermal stability of Co/Cu multilayers fabricated by electrodeposition, Vickers hardness tests and
microstructure observations were conducted on both as-deposited and annealed Co/Cu multilayers having a layer thickness of
100 nm. The multilayers were annealed at temperatures ranging from 473 to 1,273 K for 1 h. It is confirmed that even after
the annealing at 1,023 K, the multilayer maintained the high hardness (Hv231) which was comparative to that of the as-deposited
Co/Cu multilayer. When the annealing temperature was higher than 1,073 K, the hardness decreased rapidly with increasing temperature.
Scanning electron microscopy (SEM) observation revealed that the multilayered structures were still maintained without any
layer damages after the annealing at the temperatures less than 873 K. At the cross sections of the Co/Cu multilayers annealed
at T > 923 K, several copper layers were fragmented. The layered structure finally disappeared by the annealing at 1,273 K. The
rapid decrease in the hardness at T > 1,073 K is simply understood from the annihilation of the Co/Cu interfaces. |
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