用X射线能谱同时测定薄膜成分及厚度

本文提出一个直接利用薄膜和衬底的X射线能谱来同时测定薄膜的成分和厚度的新方法,利用薄膜发出的各元素的标识X射线强度比确定其成分,利用NaCl衬底的Nak_α和Clk_α标识X射线的强度随膜厚增大而衰减的定量关系确定膜厚,本方法不需要纯元素的块状标样,对在NaCl衬底上沉积的Cu-Si合金薄膜的成分和厚度,在各种实验条件下进行了测定,得到了较为满意的结果。 关键词：

SIMULTANEOUS MEASUREMENT OF THE CONSTITUENT AND THICKNESS OF THIN FILM BY X-RAY EDS

A new method which can simultaneously determine the constituent and thickness of the alloy films using the X-ray EDS has been developed. The constituent is determined by the ratios of the k_α intensties of elements in the film. The thickness of the film deposited on a NaCl substrate is measured by the attenuation of the ratios of Na k_α intensity/Cl k_α intensity. It is not necessary to use bulk standards of pure elements. This method has been applied to Cu-Si alloy films of different thickness deposited on NaCl substrate. Under various experimental conditions, the constituent and thickness data are determined satisfactorily.