| 电子束辐照下的石墨烯上的原子层沉积Al2O3介质层 |
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| 引用本文： | 蒋然,孟令国,张锡健,Hyung-Suk Jung,Cheol Seong Hwang.电子束辐照下的石墨烯上的原子层沉积Al2O3介质层[J].半导体学报,2012,33(9):093004-4. |
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| 作者姓名： | 蒋然 孟令国 张锡健 Hyung-Suk Jung Cheol Seong Hwang |
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| 基金项目： | 山东大学自主创新基金；中国博士后特别资助；中国博士后面上项目；山东省博士后创新项目专项资助 |
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| 摘 要： | 为了研究石墨烯与高k介质的结合，使用原子层沉积氧化铝在石墨衬底上。沉积前使用电子束辐照，观测到了氧化铝明显改善的形貌。归因于电子束辐照过程中的石墨层的无定形变化过程。
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| 关 键 词： | 原子层沉积 电子束照射 高k电介质 石墨表面 氧化铝 超薄 Al2O3 形态观察 |
| 修稿时间： | 5/28/2012 9:56:07 PM |
Atomic layer deposition of an Al2O3 dielectric on ultrathin graphite by using electron beam irradiation |
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| Jiang Ran,Meng Lingguo,Zhang Xijian,Hyung-Suk Jung and Cheol Seong Hwang.Atomic layer deposition of an Al2O3 dielectric on ultrathin graphite by using electron beam irradiation[J].Chinese Journal of Semiconductors,2012,33(9):093004-4. |
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| Authors: | Jiang Ran Meng Lingguo Zhang Xijian Hyung-Suk Jung and Cheol Seong Hwang |
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| Affiliation: | 1. School of Physics, Shandong University, Jinan 250100, China
2. Department of Materials Science and Engineering, Seoul National University, Seoul 151-747, Korea |
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| Abstract: | Atomic layer deposition of an Al2O3 dielectric on ultrathin graphite is studied in order to investigate the integration of a high k dielectric with graphite-based substrates. Electron beam irradiation on the graphite surface is followed by a standard atomic layer deposition of Al2O3. Improvement of the Al2O3 layer deposition morphology was observed when using this radiation exposure on graphite. This result may be attributed to the amorphous change of the graphite layers during electron beam irradiation. |
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| Keywords: | Al2O3 high k atomic layer deposition graphene |
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