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Changes in the refractive index of fused silica due to implantation of transition-metal ions |
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| Authors: | R F Haglund Jr H C Mogul and R A Weeks R A Zuhr |
| Affiliation: | Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235, USA Department of Materials Science and Engineering, Vanderbilt University, Nashville, TN 37235, USA Solid-State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA |
| Abstract: | The changes in the refractive index of high purity silica glass produced by implantation of Ti+, Cr+, Mn+, Fe+ and Cu+ ions at 160 keV were measured using ellipsometry at a wavelength of 633 nm. Implantation doses ranged from 1015 to 6 × 1016 ions cm−2. At the highest doses, a relative increase in refractive index of approximately 15% for implanted Cu ions and an increase of about half that for implanted Cr, Mn and Fe ions are observed. These variations in index probably result from colloid formation. For implanted Ti, virtually no change in the measured index of refraction was observed even at the highest doses. |
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