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XPS Investigation on Surface and Interface Electronic States of Alq3/ITO
引用本文:ZHANGFu-jia ZHENGDai-shun 等. XPS Investigation on Surface and Interface Electronic States of Alq3/ITO[J]. 半导体光子学与技术, 2001, 7(3): 143-149
作者姓名:ZHANGFu-jia ZHENGDai-shun 等
作者单位:Dept.ofPhys.,LabzhouUniversity,Lanzhou730000,CHN
摘    要:The surface and interface electronic states of tris-(8-hydroxyquinoline)aluminum(Alq3)/indium-tin oxid(ITO)were measured and analyzed by X-ray photoelectron spectroscopy(XPS).The results indicated that, in Alq3 molecule,the binding energy(Eb)of Al atoms is 70.7eV and 75.1eV,corresponding to Al(O)and Al(Ⅲ),respectively;The binding energy of C is 285.8eV,286.3eV,and 286.8eV,corresponding to C of C-C group,C-O,and C-N bond,respectively,N is the main peak locating at 401.0eV, corresponding to Natom of C-N=C.Oatoms mainly bond o H atom,with the binding energy of 533.2 eV.As the sputtering time of Ar^ ion bearn increases,Al2p,C1s,N1s,O1s,Ind3d5/2 and Sn3d5/2 peaks slightly shift towards lower binding energy,and Al2p,C1s and N1s peaks get weaker,which contributed to diffusing the oxygen,indium and tin in ITO into Alq3 layr.

关 键 词:X射线 光电子能谱法 表面状态 接口状态 铝 发光二极管 发光器件
收稿时间:2001-02-27

XPS Investigation on Surface and Interface Electronic States of Alq3/ITO
Zhang Fujia,ZHENG Daishun,WANG Yanyong,HU Haibing. XPS Investigation on Surface and Interface Electronic States of Alq3/ITO[J]. Semiconductor Photonics and Technology, 2001, 7(3): 143-149
Authors:Zhang Fujia  ZHENG Daishun  WANG Yanyong  HU Haibing
Abstract:The surface and interface electronic states of tris-(8-hydroxyquinoline) aluminum (Alq3)/indium-tin oxide (ITO) were measured and analyzed by X-ray photoelectron spectroscopy (XPS). The results indicated that, in Alq3molecule, the binding energy (Eb) of Al atoms is 70.7 eV and 75.1 eV, corresponding to Al(O) and Al(Ⅲ), respectively; The binding energy of C is 285.8 eV, 286.3 eV, and 286.8 eV, corresponding to C of C-C group, C-O, and C-N bond, respectively. N is the main peak locating at 401.0 eV, corresponding to N atom of C-N=C. O atoms mainly bond to H atom, with the binding energy of 533. 2 eV. As the sputtering time of Ar+ion beam increases, Al2p, C1s, N1s, O1s, In3d5/2and Sn3d5/2 peaks slightly shift towards lower binding energy, and Al2p, C1sand N1speaks get weaker, which contributes to diffusing the oxygen, indium and tin in ITO into Alq3 layer.
Keywords:XPS  Alq 3/ITO  Surface state  Interface state
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