Reduced leakage current of nickel induced crystallization poly-Si TFTs by a simple chemical oxide layer |
| |
Authors: | Ming-Hui LaiYewChung Sermon Wu |
| |
Affiliation: | Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan, ROC |
| |
Abstract: | Ni-metal-induced crystallization (MIC) of amorphous Si (α-Si) has been used to fabricate low-temperature polycrystalline silicon (poly-Si) thin-film transistors (TFTs). However, the leakage current of MIC-TFT is high. In this study, a chemical oxide layer was used to avoid excess of Ni atoms into α-Si layer during MIC process, which was simple and without extra expensive instrument. The minimum leakage current and on/off current ratio were significantly improved. |
| |
Keywords: | Metal-induced crystallization (MIC) Thin film transistors (TFTs) Chemical oxide Leakage current Poly-Si |
本文献已被 ScienceDirect 等数据库收录! |