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Optical properties of Si0.8Ge0.2/Si multiple quantum wells
Authors:K.H. Shim  Y.-H. Kil  H.K. Lee  M.I. Shin  T.S. Jeong  S. Kang  C.-J. Choi  T.S. Kim
Affiliation:Semiconductor Physics Research Center, School of Semiconductor and Chemical Engineering, Department of Physics, Chonbuk National University, Jeonju 561-756, Republic of Korea
Abstract:The optical property was studied on the Si0.8Ge0.2/Si strained multiple quantum well (MQW) structure grown using ultra-high vacuum chemical vapor deposition (UHV-CVD). Three peaks are observed in Raman spectrum, which are located at about 510, 410, and 300 cm−1, corresponding to the vibration of Si–Si, Si–Ge, and Ge–Ge phonons, respectively. The photoluminescence (PL) spectrum originates from the radiative recombinations both from the Si substrate and the Si0.8Ge0.2/Si MQW. For Si0.8Ge0.2/Si strained MQW, the transition peaks related to the MQW region observed in the photocurrent (PC) spectrum were preliminarily assigned to electron–heavy hole (e–hh) and electron–light hole (e–lh) fundamental excitonic transitions.
Keywords:Raman   PL   PC   MQW   UHV-CVD   SiGe
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