|
|||||
|
|
| 基于Si3N4掩模的太阳电池选择性掺杂工艺研究 | |
| 引用本文： | 王强,张竹青,沈明荣,花国然,张华,李志锋. 基于Si3N4掩模的太阳电池选择性掺杂工艺研究[J]. 半导体光电, 2013, 34(2): 259-263 |
| 作者姓名： | 王强 张竹青 沈明荣 花国然 张华 李志锋 |
| 作者单位： | 1. 苏州大学物理科学与技术学院,江苏苏州215006;南通大学电子信息学院,江苏南通226019 2. 南通大学机械工程学院,江苏南通,226019 3. 苏州大学物理科学与技术学院,江苏苏州,215006 4. 江苏综艺光伏有限公司,江苏南通,226376 |
| 基金项目： | 国家自然科学青年基金项目(51205212);南通市重大科技创新专项项目(XA2009014);南通市应用研究计划项目(K2010014);南通大学研究生科技创新项目(YKC12064);南通市应用研究计划项目(BK2011024) |
| 摘 要： | 设计了基于Si3N4掩模的太阳电池选择性掺杂工艺,并对其工艺参数进行了仿真优化。选择性掺杂电池的一次掺杂条件为仿真所得最佳非选择性掺杂电池的工艺参数。运用SILVACO软件分别对选择性掺杂的时间、预淀积浓度和温度进行了仿真研究。仿真结果表明,随着选择性掺杂的预淀积浓度的增加,光谱响应率先增加后降低;随着扩散温度和扩散时间的增加,电池的光谱响应率逐渐减小。所得最佳选择性掺杂工艺参数为预淀积磷硅玻璃杂质浓度1×1019 cm-3、扩散温度800℃、扩散时间5min。 |
| 关 键 词： | 选择性掺杂 太阳电池 光谱响应 工艺仿真 Si3N4掩模 |
| 收稿时间： | 2012-10-29 |
Study on Selective Emitter Solar Cell Fabrication Process with Si3N4Mask Layer |
|
| WANG Qiang,ZHANG Zhuqing,SHEN Mingrong,HUA Guoran,ZHANG Hua and LI Zhifeng. Study on Selective Emitter Solar Cell Fabrication Process with Si3N4Mask Layer[J]. Semiconductor Optoelectronics, 2013, 34(2): 259-263 | |
| Authors: | WANG Qiang ZHANG Zhuqing SHEN Mingrong HUA Guoran ZHANG Hua LI Zhifeng |
| Affiliation: | 1.School of Physics,Suchow University,Suzhou 215006,CHN;2.School of Electronics and Information, Nantong University,Nantong 226019,CHN;3.School of Mechanical Engineering,Nantong University,Nantong 226019,CHN; 4.ZONEPV(Jiangsu),Nantong 226376,CHN;1.School of Physics,Suchow University,Suzhou 215006,CHN;2.School of Electronics and Information, Nantong University,Nantong 226019,CHN;3.School of Mechanical Engineering,Nantong University,Nantong 226019,CHN; 4.ZONEPV(Jiangsu),Nantong 226376,CHN;1.School of Physics,Suchow University,Suzhou 215006,CHN;2.School of Electronics and Information, Nantong University,Nantong 226019,CHN;3.School of Mechanical Engineering,Nantong University,Nantong 226019,CHN; 4.ZONEPV(Jiangsu),Nantong 226376,CHN;1.School of Physics,Suchow University,Suzhou 215006,CHN;2.School of Electronics and Information, Nantong University,Nantong 226019,CHN;3.School of Mechanical Engineering,Nantong University,Nantong 226019,CHN; 4.ZONEPV(Jiangsu),Nantong 226376,CHN;1.School of Physics,Suchow University,Suzhou 215006,CHN;2.School of Electronics and Information, Nantong University,Nantong 226019,CHN;3.School of Mechanical Engineering,Nantong University,Nantong 226019,CHN; 4.ZONEPV(Jiangsu),Nantong 226376,CHN;1.School of Physics,Suchow University,Suzhou 215006,CHN;2.School of Electronics and Information, Nantong University,Nantong 226019,CHN;3.School of Mechanical Engineering,Nantong University,Nantong 226019,CHN; 4.ZONEPV(Jiangsu),Nantong 226376,CHN |
| Abstract: | |
| Keywords: | selective emitter solar cell spectrum response process simulation Si3N4mask layer |
| 本文献已被 CNKI 万方数据 等数据库收录！ | |
| 点击此处可从《半导体光电》浏览原始摘要信息 | |
| 点击此处可从《半导体光电》下载全文 | |
