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Lpe growth of Hgl?xCdxTe using conventional slider boat and effects of annealing on properties of the epilayers
Authors:K Nagahama  R Ohkata  K Nishitani  T Murotani
Affiliation:(1) LSI Research and Development Laboratory, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, 664 Hyogo, Japan
Abstract:The epitaxial layers of Hg1−xCdxTe (0.17≦×≦0.3) were grown by liquid phase epitaxy on CdTe (111)A substrates using a conventional slider boat in the open tube H2 flow system. The as-grown layers have hole concentrations in the 1017− 1018 cm−3 range and Hall mobilities in the 100−500 cm2/Vs range for the x=0.2 layers. The surfaces of the layers are mirror-like and EMPA data of the layers show sharp compositional transition at the interface between the epitaxial layer and the substrate. The effects of annealing in Hg over-pressure on the properties of the as-grown layers were also investigated in the temperature range of 250−400 °C. By annealing at the temperature of 400 °C, a compositional change near the interface is observed. Contrary to this, without apparent compositional change, well-behaved n-type layers are obtained by annealing in the 250−300 °C temperature range. Sequential growth of double heterostructure, Hgl−xCdxTe/Hgl−yCdyTe on a CdTe (111)A substrate was also demonstrated.
Keywords:liquid phase epitaxy  Hgl−  xCdxTe  multilayer growth  annealing  infrared detector
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