光刻机照明系统专利分析

为了解光刻机照明系统的技术发展方向和技术研究热点及技术成熟度,并为科研人员提供技术参考,对光刻机照明系统技术专利文献进行了检索,并对专利文献数据进行了统计分析,分别从专利权人分布、国际专利分类号分布、专利申请国分布和年度发展趋势及技术生命周期等几个方面进行统计分析,揭示了国内外光刻机照明系统专利申请的主要专利权人依次为阿斯麦、尼康、佳能和蔡司,专利文件分布的主要技术领域为半导体器件和其部件的制造处理等方面,专利文件的年度申请在2004年出现最高峰,之后开始下降,并结合技术生命周期曲线图,指出光刻机照明系统技术已经历了从萌芽、发展、成熟阶段。同时进行了重要专利文件的挖掘,分析了技术研究热点,追踪核心专利文件的技术发展脉络;并对偏振照明技术作出技术-功效矩阵分析图,分析出技术研究热点,并提出我国科研人员应利用未在我国进行保护的重要专利技术,为我国企业提出了专利申请的相关建议,节省研发时间。

Lithography Illumination Patent Analysis

In order to analysis the hot point of technology developing and make tracks for improtant patents＇s technology route, and make suggestions for scientist , Patents on illumination system of lithography were analized statisticlly, then analysis the data. Analysising distribution of patentee, in terms of distribution of IPC, distribution of patents appliation country, as well as yearly technological developing trend, The current status and technology trend on patents in illumination system of lithography field were discoved.It indicates that the top 4 patentees are ASML,Nikon,Canon,and Zeiss orderly;patents distrubition of IPC are HOlL/21/02, HOlL/20/27, and G03F/07/20;and then in year 2004 the quantity of patent application came out the peak value, declined in the follow years, referencing the technoloty lifecycle tiger discoverded that illumination system of lithography has been go through sprout, growable, and maturation phase. Discoving ten important patents, analysis the hotpoint of technology developing and make tracks for improtant patents technology route. The writer makes a technique-effect matrix chart of polarization illumination technology field, it is served as a guide for hot research fields.lt is suggestted that chinese researchers could legally make use of some important patents that are not applied in our country, shorting their research period in this field.