| 氧化镁薄膜二次电子发射系数的测试方法 |
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| 引用本文： | 龙建飞,罗崇泰,王多书,李晨. 氧化镁薄膜二次电子发射系数的测试方法[J]. 真空与低温, 2009, 15(4): 238-243 |
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| 作者姓名： | 龙建飞 罗崇泰 王多书 李晨 |
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| 作者单位： | 兰州物理研究所,表面工程技术国家级重点实验室,甘肃,兰州,730000 |
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| 摘 要： | 综述了氧化镁薄膜二次电子发射系数的主要测试方法，包括静电法、脉冲中和法、双枪法、热控法、单脉冲法以及PDP间接法等。阐述了各测试方法的原理以及在测试中各自的优点和不足。分析表明，脉冲中和法和双枪法比较适合用于测试氧化镁薄膜二次电子发射。
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| 关 键 词： | 测试方法 氧化镁薄膜 二次电子发射系数 |
METHODS OF MEASURING THE SECONDARY ELECTRON EMISSION COEFFICIENT IN MgO FILMS |
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| LONG Jian-fei,LUO Chong-tai,WANG Duo-shu,LI Chen. METHODS OF MEASURING THE SECONDARY ELECTRON EMISSION COEFFICIENT IN MgO FILMS[J]. Vacuum and Cryogenics, 2009, 15(4): 238-243 |
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| Authors: | LONG Jian-fei LUO Chong-tai WANG Duo-shu LI Chen |
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| Affiliation: | (National Key Laboratory of Science and Technology on Surface Engineering, Lanzhou Institute of Physics, Lanzhou 730000, China) |
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| Abstract: | The main methods of measuring the secondary electron emission coefficient in MgO films, including electrostatic method, pulsed neutralization method, double electron gun method, thermal control method, monopoles＇ method and indirect method in PDP are summarized. The principles of the methods and their advantages and disadvantages are expatiated respectively. Working conditions in methods of measuring are suggested. According to the analysis, pulsed neutralization method and double electron gun method are preferable. |
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| Keywords: | measure method MgO thin film secondary electron emission coefficient |
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