首页 | 官方网站   微博 | 高级检索  
     

硫掺杂C60薄膜电学性质研究
引用本文:陈光华,姚江宏,王永谦,邹云娟.硫掺杂C60薄膜电学性质研究[J].物理学报,1997,46(6):1183-1187.
作者姓名:陈光华  姚江宏  王永谦  邹云娟
作者单位:(1)北京工业大学应用物理系;兰州大学物理系; (2)兰州大学物理系
基金项目:国家自然科学基金资助的课题.
摘    要:对硫掺杂C60薄膜样品在433K进行真空退火,并测量了其电导率随温度的变化关系.发现硫掺杂后C60薄膜的电导激活能减小,电导率显著增大.电导率随温度的变化曲线在368K到388K的范围内,存在一个电导率与温度的关系不严格遵循指数规律的过渡区,在过渡区的两侧硫掺杂的C60薄膜则表现出明显的半导体特性,这是由于在不同温度范围内样品中硫分子的结构相变所引起的 关键词

关 键 词:硫掺杂  碳60  电学性质  薄膜  富勒烯分子
收稿时间:1996-10-08

ELECTRICAL PROPERTIES OF SULFUR-DOPED C60 FILMS
CHEN GUANG-HUA,YAO JIANG-HONG,WANG YONG-QIAN and ZOU YUN-JUAN.ELECTRICAL PROPERTIES OF SULFUR-DOPED C60 FILMS[J].Acta Physica Sinica,1997,46(6):1183-1187.
Authors:CHEN GUANG-HUA  YAO JIANG-HONG  WANG YONG-QIAN and ZOU YUN-JUAN
Abstract:The temperature dependencies of electrical conductivity of sulfur-doped C60 films were measured after annealing at 433K. The results showed that the conductive activation energy decreased and electrical conductivity of C60 films increased after sulfur-doping. From the logarithmic curve of the electrical conductivity versus temperature,a transition zone was seen where the conductivity did not vary with temperature exponentially;however,when above 388K or below 368K,sulfur-doped C60 films showed obvious semiconductive properties. This phenomenon is due to the phase transformation of sulfur molecules in the film.
Keywords:
本文献已被 CNKI 维普 等数据库收录!
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号