Effects of process conditions on the synthesis and microstructure of nano-scale metal-containing amorphous carbon thin films |
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Authors: | Wu Wan-Yu Ting Jyh-Ming |
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Affiliation: | Department of Materials Science and Engineering, National Cheng Kung University, 701 Tainan, Taiwan. |
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Abstract: | Thin films of metal-containing amorphous carbon (a-C:Me) were deposited on a number of substrates, including silicon, Pt coated silicon, carbon coated silicon, polymer, and glass. The deposition was performed in a dc reactive sputter deposition system equipped with one single magnetron gun. The gases used were various mixtures of CH4 + Ar. The gas mixture was admitted to the deposition chamber at constant flow rate and ratio. Self-assembled alternating layer structure was observed under certain deposition conditions. Correlation between the self-assembled alternating layer structure and deposition parameters is presented and discussed. The role of carbon energy in the segregation of metal and carbon to form the layer structure is addressed. |
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