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高性能钆铝锌氧薄膜晶体管的制备
引用本文:董俊辰,郁文,李慧津,韩德栋,张盛东,张兴,王漪.高性能钆铝锌氧薄膜晶体管的制备[J].液晶与显示,2017,32(5):339-343.
作者姓名:董俊辰  郁文  李慧津  韩德栋  张盛东  张兴  王漪
作者单位:1. 北京大学 微电子学研究院, 北京 100871;
2. 北京大学 深圳研究生院, 广东 深圳 518055
基金项目:国家自然科学基金(No.61275025)
摘    要:本文研究并制备了钆铝锌氧薄膜和以钆铝锌氧为有源层的薄膜晶体管。钆铝锌氧薄膜材料的光致发光光谱和透过率说明钆铝锌氧薄膜在透明显示方向的应用潜力。透射电子显微镜揭示了钆铝锌氧薄膜的非晶态微观结构。钆铝锌氧薄膜晶体管显示了良好的转移特性和输出特性。器件开关比大于10~5、饱和迁移率约为10cm~2·V~(-1)·s~(-1)。实验结果表明,钆铝锌氧薄膜可用作氧化物薄膜晶体管的有源层材料;钆铝锌氧薄膜晶体管可作为像素电路的驱动器件。

关 键 词:钆铝锌氧  薄膜晶体管  有源层
收稿时间:2016-09-29

Fabrication of high performance Gadolinium-aluminum-zinc-oxide thin film transistors
DONG Jun-chen,YU Wen,LI Hui-jin,HAN De-dong,ZHANG Sheng-dong,ZHANG Xing,WANG Yi.Fabrication of high performance Gadolinium-aluminum-zinc-oxide thin film transistors[J].Chinese Journal of Liquid Crystals and Displays,2017,32(5):339-343.
Authors:DONG Jun-chen  YU Wen  LI Hui-jin  HAN De-dong  ZHANG Sheng-dong  ZHANG Xing  WANG Yi
Affiliation:1. Institute of Microelectronics, Peking University, Beijing 100871, China;
2. Shenzhen Graduate School, Peking University, Shenzhen 518055, China
Abstract:Because of the advantages in high mobility and low temperature process, oxide thin film transistor (TFT) becomes the hotspot in display technology at present. Gadolinium-aluminum-zinc-oxide (GdAZO) thin film and GdAZO TFT (active layer is GdAZO thin film) were fabricated. The photoluminescence spectra and the transmittance of GdAZO thin film demonstrate the application potential in transparent display. The transmission electron microscope image discovers the amorphous microstructure of the GdAZO thin film. The GdAZO TFTs manifests preferable transfer characteristics and output characteristics. The on-to-off current ratio is larger than 105, and the saturation mobility is about 10 cm2·V-1·s-1. The results imply that the GdAZO is a category of feasible candidate for oxide TFTs, besides, the GdAZO TFTs can serve as the drive devices in pixel circuits.
Keywords:GdAZO  TFT  active layer
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