A micromachined, shadow-mask technology for the OMVPE fabrication of integrated optical structures |
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| Authors: | G M Peake L Zhang N Y Li A M Sarangan C G Willison R J Shul S D Hersee |
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| Affiliation: | (1) Center for High Technology Materials and the Electrical and Computer Engineering Department, University of New Mexico, 1313 Goddard SE, 87106 Albuquerque, New Mexico;(2) Sandia National Laboratories, Albuquerque, New Mexico;(3) Now at Emcore West, Albuquerque, New Mexico |
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| Abstract: | A micromachined, silicon shadow-mask technology is described which extends the capabilities of shadow-masked OMVPE for the
fabrication of nonplanar micro-optical elements. The deep reactive ion etched (DRIE) shadow mask is inexpensive, reusable
and produces smooth, nonplanar structures with precise control of position, shape and size. Direct fusion bonding of the mask
to the substrate was found to be a reliable and reproducible method for attaching the mask to the substrate during growth.
The DRIE shadow mask technology allows the deposition of microlenses with focal lengths out to 3 mm without the central flattening
that was previously observed in shadow masked lenses grown under the epitaxial mask. We also describe novel applications of
this technology in the fabrication of micromirrors and concentrically-variable Bragg reflectors, which should improve mode
discrimination in large aperture VCSELs. |
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| Keywords: | OMVPE MOCVD SMG shadow mask nonplanar epitaxy integrated optics micromachining microoptics direct fusion bonding |
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