Single-atom microscopy in wide-bandgap nitrides |
| |
Authors: | Ryo Ishikawa Naoya Shibata Fumiyasu Oba Takashi Taniguchi Yuichi Ikuhara |
| |
Affiliation: | 1. Institute of Engineering Innovation, University of Tokyo, Bunkyo, Tokyo, Japan;2. Laboratory for Materials and Structures, Institute of Innovative Research, Tokyo Institute of Technology, Yokohama, Japan;3. International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Ibaraki, Japan |
| |
Abstract: | Wide bandgap III-nitrides, such as cubic boron nitride and wurtzite-type aluminum nitride, are promising systems for optoelectronics. To extend their luminescent properties, we doped single Ce atoms into III-nitride single crystals using reactive flux with a temperature gradient method at high-pressure and high-temperature conditions. To fully understand such properties in a large size-mismatch system, it is critically important to determine the point-defect structures of single dopants, their spatial distribution in three dimensions, and their atomistic dynamics at an atomic level. This review discusses point defect structures and their dynamics in III-nitrides using single-atom-sensitive scanning transmission electron microscopy, and the recent progress in the related field of electron microscopy. |
| |
Keywords: | atomic-resolution ADF STEM depth sectioning HPHT III-nitride luminescent dopant |
|
|