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A New In Situ Microscopy Approach to Study the Degradation and Failure Mechanisms of Time‐Dependent Dielectric Breakdown: Set‐Up and Opportunities
Authors:Zhongquan Liao  Martin Gall  Kong Boon Yeap  Christoph Sander  Oliver Aubel  Uwe Mühle  Jürgen Gluch  Sven Niese  Yvonne Standke  Rüdiger Rosenkranz  Markus Löffler  Norman Vogel  Armand Beyer  Hans‐Jürgen Engelmann  Peter Guttmann  Gerd Schneider  Ehrenfried Zschech
Affiliation:1. Fraunhofer Institute for Ceramic Technologies and Systems, Dresden, Germany;2. Dresden Center for Nanoanalysis, Technische Universit?t Dresden, Dresden, Germany;3. Fraunhofer Institute for Ceramic Technologies and Systems, D‐01109 Dresden, Germany;4. GLOBALFOUNDRIES, Fab 8, New York, USA;5. GLOBALFOUNDRIES Dresden Module One LLC& Co. KG, D‐01109 Dresden, Germany;6. Dresden Center for Nanoanalysis, Technische Universit?t Dresden, D‐01187 Dresden, Germany;7. Helmholtz Zentrum Berlin, D‐12489 Berlin, Germany
Abstract:
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