| 常压化学气相沉积法制备氟掺杂TiO_2自清洁薄膜 |
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| 引用本文： | 宋晨路,刘军波,翁伟浩,翁文剑. 常压化学气相沉积法制备氟掺杂TiO_2自清洁薄膜[J]. 硅酸盐学报, 2010, 38(1) |
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| 作者姓名： | 宋晨路 刘军波 翁伟浩 翁文剑 |
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| 作者单位： | 1. 浙江大学材料科学与工程学系,杭州,310027
2. 杭州蓝星新材料技术有限公司,杭州,310012 |
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| 基金项目： | 国家教育部博士点基金(20050335040)资助项目 |
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| 摘 要： | 以四异丙醇钛[Ti(OC3H7)4,TTIP]和三氟乙醇(CF3CH2OH,TFE)为前驱体,采用常压化学气相沉积制备了氟(F)掺杂TiO2自清洁薄膜。通过扫描电镜、X射线衍射、紫外-可见透射光谱等手段对样品进行分析,研究了前驱体TFE的流量与薄膜性能之间的关系。结果表明:前驱体TFE的引入会在TiO2中掺入F并抑制薄膜中锐钛矿相的形成。光催化性能和亲水性能测试表明,沉积F掺杂TiO2薄膜的最佳TFE流量为5.94L/min。
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| 关 键 词： | 二氧化钛 氟 掺杂 常压化学气相沉积 自清洁 |
PREPARATION OF FLUORINE-DOPED TITANIA SELF-CLEANING FILMS BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION |
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| SONG Chenlu,LIU Junbo,WENG Weihao,WENG Wenjian. PREPARATION OF FLUORINE-DOPED TITANIA SELF-CLEANING FILMS BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION[J]. Journal of The Chinese Ceramic Society, 2010, 38(1) |
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| Authors: | SONG Chenlu LIU Junbo WENG Weihao WENG Wenjian |
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| Affiliation: | 1.Department of Materials Science and Engineering;Zhejiang University;Hangzhou 310027;2.Hangzhou Bluestar New Materials Technology Co.Ltd.;Hangzhou 310012;China |
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| Abstract: | A fluorine (F)-doped titania (TiO2)-based film on glass for self-cleaning purposes was prepared using Ti(OC3H7)4 and CF3CH2OH (TFE) as precursors by an atmospheric pressure chemical vapor deposition method.The effect of the TFE flow rate on the properties of the films was analyzed by scanning electron microscope,X-ray diffractometer and ultraviolet visible transmission spectrum.The results show that F can be doped into the TiO2 films,and the formation of anatase phase is suppressed by adding the TFE.The opt... |
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| Keywords: | titania fluorine doping atmospheric pressure chemical vapor deposition self-cleaning |
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