电沉积制备镍-铁薄膜及其性能的研究

研究了电流密度对镍-铁薄膜的电化学过程、成分、表面形貌、耐蚀性和磁性能的影响。通过实验发现,镍-铁薄膜的电沉积属于一种"异常共沉积"现象。低电流密度下,镍-铁薄膜中铁的质量分数较高;高电流密度下,镍-铁薄膜中镍的质量分数较高。镍-铁薄膜属于一种典型的颗粒膜层,在4A/dm2下制得的镍-铁薄膜表面致密、颗粒细致、耐蚀性较好。随着电流密度的增大,镍-铁薄膜的矫顽力逐渐升高,而比饱和磁化强度逐渐降低。

Investigation on Electrodeposition Preparation and Properties of Ni-Fe Films

Effect of current density on the electrochemistry process,components,surface morphology,corrosion resistance and magnetic property of Ni-Fe films was investigated.Through the experiment,it was found that,electrodeposition of Ni-Fe film belonged to a kind of anomalous co-deposition phenomenon.At low current density,the mass fraction of iron in Ni-Fe film was higher.However,at high current density,the mass fraction of nickel in Ni-Fe film was higher.The Ni-Fe film prepared at 4 A/dm2 exhibit typical nodular structure,which possess dense surface and refined grain,resulting in better corrosion resistance.With the increasing of current density,the coercivity of Ni-Fe film was increased,while the saturation magnetization was decreased.