| Cu掺杂对FexPt1－x薄膜有序化的影响 |
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| 引用本文： | 李宝河,冯春,杨涛,翟中海,滕蛟,于广华,朱逢吾.Cu掺杂对FexPt1－x薄膜有序化的影响[J].物理学报,2006,55(5):2567-2571. |
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| 作者姓名： | 李宝河 冯春 杨涛 翟中海 滕蛟 于广华 朱逢吾 |
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| 作者单位： | (1)北京科技大学材料物理系，北京 100083; (2)北京科技大学材料物理系，北京 100083；北京工商大学数理部，北京 100037; (3)北京科技大学材料物理系，北京 100083；沈阳建筑大学理学院，沈阳 110168 |
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| 基金项目： | 中国科学院资助项目;北京市教委科技发展计划项目 |
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| 摘 要： | 利用磁控溅射制备了薄膜厚度为50nm的系列(FexPt1-x)100-yCuy(x=0.46—0.56,y=0,0.04,0.12) 样品.利用直流共溅射方法精确控制Fe和Pt的原子比.实验结果表明，当x>0.52时，样品中添加Cu不能促进FePt的有序化，但是对于FePt化学原子定比或富Pt的样品，添加Cu可以促进FePt有序化，而且随着Fe含量的减少，需要更多的Cu添加才能实现较低温度下FePt薄膜的有序化.实验结果表明，原子比(FeCu)/Pt达到1.1—1.2的范围时，即可实现较低温度的有序化.
关键词：
0-FePt有序相')" href="#">L10-FePt有序相
磁控溅射
有序度
Cu掺杂
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| 关 键 词： | L10-FePt有序相 磁控溅射 有序度 Cu掺杂 |
| 文章编号： | 1000-3290/2006/55（05）2567-05 |
| 收稿时间： | 10 25 2005 12:00AM |
| 修稿时间： | 2005-10-252005-11-22 |
The effect of Cu doping on the ordering of Fex Pt1-x thin films |
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| Li Bao-He,Feng Chun,Yang Tao,Zhai Zhong-Hai,Teng Jiao,Yu Guang-Hua,Zhu Feng-Wu.The effect of Cu doping on the ordering of Fex Pt1-x thin films[J].Acta Physica Sinica,2006,55(5):2567-2571. |
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| Authors: | Li Bao-He Feng Chun Yang Tao Zhai Zhong-Hai Teng Jiao Yu Guang-Hua Zhu Feng-Wu |
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| Affiliation: | 1 Department of Material Physics and Chemistry, Beijing University of Science and Technology, Beijing 100083, China;2 Department of Mathmatics and Physics, Beijing Technology and Business University, Beijing 100037, China ;3 College of Science , Shenyang Jianzhu University, Shenyang 110168,China |
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| Abstract: | (FexPt1-x)100-yCuy(x=0.46—0.56,y=0,0.04,0.12) thin films with a fixed thickness of 50nm have been prepared by magnetron sputtering. The atomic ratio of Fe to Pt atoms was accurately controlled by DC co-sputtering. The ordering parameter of the L10 phase is not enhanced for the films with x>0.52. On the contrary, the ordering process is improved by the addition of Cu for the Pt-rich or stoichiometric thin films. In order to get the ordering of FePt films at a low annealing temperature, the lower the Fe content, the more addition of Cu is needed. It is found that the L10 phase can be obtained after annealing at 350℃ for 20 min only for films with the ratio of the (FeCu)/Pt in the range of 1.1—1.2. |
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| Keywords: | L10-FePt order phase magnetron sputtering ordering parameter doping with Cu |
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