Tailoring structural and electrical properties of A-site nonstoichiometric Na0.5Bi0.5(Ti0.97Ni0.03)O3 ferroelectric films deposited on LaNiO3(100)/Si substrate

Highly (l00)-oriented Ni-doped Na_0.5Bi_0.5TiO₃ (NBTNi) thin films with different A-site cation nonstoichiometry were deposited on the LaNiO₃ (100)/Si substrates. We find that low levels of Na/Bi nonstoichiometry in the original composition of NBTNi films have obvious influence on the crystal structure and ferro-/dielectric properties. Na deficiency or Bi excess can lower the leakage current compared to the stoichiometric sample due to the decreased oxide-site vacancies. However, the mechanisms for the two types of films are different. That is, the mobile oxygen vacancies are tied by the Na vacancies in Na deficiency film whereas the formation of oxygen vacancies is suppressed for Bi-rich film. A good combination of ferroelectric property (P_r = 22.7?μC/cm²) and dielectric property (ε_r = 360 and tan?δ?=?0.11) can be achieved in Bi-rich NBTNi (Na_0.5Bi_0.54TNi) film. Besides, the effect of voltage and frequency on the capacitance and dielectric tunability for the Na_0.5Bi_0.54TNi film is investigated solely. These results show that NBT-based thin film is quite flexible in A-site nonstoichiometry, which provides a broad space for performance improvement.