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全耗尽SOI MOSFET及CMOS/SOI电路的研究
引用本文:刘永光.全耗尽SOI MOSFET及CMOS/SOI电路的研究[J].微电子学,1996,26(3):143-145.
作者姓名:刘永光
作者单位:电子工业部第24研究所
摘    要:采用SIMOX材料,研制了一种全耗尽CMOS/SOI模拟开关电路,研究了全耗尽SOI MOS场效应晶体管的阈值电压与背栅偏置的依赖关系,对漏源击穿的Snapback特性进行分析,介绍了薄层CMOS/SIMOX制作工艺,给出了全耗尽CMOS/SOI电路的测试结果。

关 键 词:半导体材料  半导体器件  SOI  MOSFET  模拟开关

Fabrication of Fully Depleted SOI MOSFET'S and CMOS/SOI IC's
ZHANG Zhengfan and LIU Yongguang.Fabrication of Fully Depleted SOI MOSFET'S and CMOS/SOI IC's[J].Microelectronics,1996,26(3):143-145.
Authors:ZHANG Zhengfan and LIU Yongguang
Affiliation:Sichuan Institute of Solid-State Circuits; Chongqing; Sichuan 630060
Abstract:Fully depleted SOI MOSFET's were fabricated using SIMOX and a CMOS/SOI analog switch was made based on SOI/MOSFET' s. The dependence of threshold voltage of fully depleted SOI MOSFET's on the back-gate bias was investigated. The snapback of drain-source breakdown was characterized. The thin CMOS/SIMOX process is brifly introduced' Test results of the developed fully depleted CMOS/SOI circuit are given.
Keywords:Semiconductor material  Semiconductor device  SOI  MOSFET  Analog switch
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