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DFB LD manufactured by nanoimprint lithography |
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| Authors: | Lei WANG Yiwen ZHANG Fei QIU Ning ZHOU Dingli WANG Zhimou XU Yanli ZHAO Yonglin YU Wen LIU |
| Affiliation: | 1. Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China 2. Accelink Technologies Co. Ltd., Wuhan 430074, China 3. Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;Accelink Technologies Co. Ltd., Wuhan 430074, China |
| Abstract: | Gratings of distributed feedback laser diodes (DFB LDs) have been successfully manufactured by nanoimprint lithography (NIL). Uniform gratings with periods of about 240 nm and phase-shifted in the center have been fabricated by a soft press NIL employing a polymer stamp technology. Moreover, the shape of the grating is rectangle, rather than sinusoidal by holography.The test results show good characteristics of the electrical and spectral output. The results of this study indicate that NIL has high potential for the manufacture of DFB LDs. |
| Keywords: | nanoimprint lithography (NIL) distributed feedback laser diode (DFB LD) soft press polymer stamp |
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