反应磁控溅射制备TiO2和Nb2O5混合光学薄膜

利用反应磁控溅射技术在BK-7基片上制备了二氧化钛和五氧化二铌均匀混合的光学薄膜.薄膜的内部微结构、表面形貌、化学成分比例以及光学性质等用X射线衍射、高分辨扫描电子显微镜、原子力显微镜、X射线光电子能谱和紫外可见近红外分光光度计进行研究；发现制备的薄膜为非晶结构，薄膜的表面平整、内部结构致密，不存在柱状结构或结晶颗粒的缺陷，TiO2与Nb2O5的成分比例大致是1∶1.54.从光学透射光谱计算的折射率和消光系数显示，在550 nm波长处的折射率为2.34，消光系数为2.0×10－4.结果表明制备的薄膜是TiO2和Nb2O5均匀混合的高质量光学薄膜.

Preparation of the TiO2 and Nb2O5 Mixed Optical Film

TiO2-Nb2O5 mixed optical film has been deposited on BK-7 substrate by the reactive magnetron sputtering technique. The microstructure,morphology,composition and optical properties have been investigated by X-ray diffraction,scanning electron microscopy,atomic force microscopy,X-ray photoelectron spectroscopy and spectrophotometer. The results show that the TiO2-Nb2O5 mixed film is amorphous and has optically flat and uniform surface. The structure of the film is compact and not column structures or defects can be observed,and the stoichiometric ratio of Nb2O5 to TiO2 is about 1.54.Refractive index and extinction coefficient of the film are determined from the normal incidence transmittance,and refractive index is 2.34 and extinction coefficient is 2.0 × 10－4 at 550 nm wavelength.These results indicate that the mixed film has high quality for optical applications.