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Reduction of sidewall roughness, insertion loss and crosstalk of polymer arrayed waveguide grating using vapor-redissolution technique |
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| Authors: | Hai-Ming Zhang Zhen-Kun Qin Xi-Zhen Zhang Shi-Yong Liu |
| Affiliation: | a State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, China b Jilin Normal University, Siping 136000, China c State Key Laboratory on Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130021, China |
| Abstract: | An efficient vapor-redissolution technique is used to greatly reduce sidewall scattering loss in the polymer arrayed waveguide grating (AWG) fabricated on a silicon substrate. Smoother sidewalls are achieved and verified by a scanning electron microscopy. Reduction of sidewall scattering loss is further measured for the loss measurement of both straight waveguides and AWG devices. The sidewall loss in straight polymer waveguide is decreased by 2.1 dB/cm, the insertion loss of our AWG device is reduced by about 5.5 dB for the central channel and 6.7 dB for the edge channels, and the crosstalk is reduced by 2.5 dB after the vapor-redissoluton treatment. |
| Keywords: | Arrayed waveguide grating Vapor-redissolution Insertion loss Crosstalk |
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