高激光损伤阈值266nm紫外增透膜研究

为了研制高激光性能紫外增透膜,分别使用HfO2/SiO2和Al2O3/MgF2两种高低折射率材料组合,采用物理气相沉积技术,设计制备了266 nm增透膜;分析测试了不同材料所组成的增透膜的剩余反射率、粗糙度、光学损耗、界面电场强度和激光诱导损伤阈值等特性。研究结果表明,两组不同膜料制备的266 nm增透膜都能达到剩余反射率<0.2%的要求,且激光诱导损伤阈值都大于5 J/cm(2266 nm,7 ns)。

Study on ultraviolet anti-reflection coating at 266nm with high laser-induced damage threshold

In order to develop high laser performance anti-reflection coating at ultraviolet wavelength,a series of anti-reflection coatings at 266nm were designed by two groups of coating materials of HfO2/SiO2 and Al2O3/MgF2 respectively,and deposited by physical vapor deposition technology.The residual reflectivity,roughness,optical loss,interfacial electric field and laser-induced damage threshold of different anti-reflection coatings were measured.The results show that the residual reflectivity of both coatings designed with different materials can meet the requirement of less than 0.2%,and both laser-induced damage threshold are over 5J/cm2 at 266 nm,7 ns.