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266nm脉冲激光光解基质隔离的cis-(NO)2
引用本文:王雪峰,余敏,秦启宗.266nm脉冲激光光解基质隔离的cis-(NO)2[J].物理化学学报,1996,12(8):673-676.
作者姓名:王雪峰  余敏  秦启宗
作者单位:Institute of Laser Chemistry,Fudan University,Shanghai 200433
摘    要:NO的氧化是大气化学研究的重要课题.CIS-(NO)。是一氧化氮氧化过程的中间体,对其在低温基质条件下的形成和氧化过程研究前文风已作了报导.H。WhiffS等门曾用中压汞灯作为光解光源(220-320urn),研究了ets-(NO)。在Ar低温基质中的光解,产物为N。O和NZO3.CIS-(NO

关 键 词:基质隔离  激光光解  cis-(NO)2  
收稿时间:1996-05-13
修稿时间:1996-06-17

266nm Pulsed Laser Photolysis of cis-(NO)_2 in Cryogenic Solid Matrix
Wang Xuefeng, Yu Min, Qin Qizong.266nm Pulsed Laser Photolysis of cis-(NO)_2 in Cryogenic Solid Matrix[J].Acta Physico-Chimica Sinica,1996,12(8):673-676.
Authors:Wang Xuefeng  Yu Min  Qin Qizong
Affiliation:Institute of Laser Chemistry,Fudan University,Shanghai 200433
Abstract:The photodissociation of cis-(NO)2 in N2 and Ar matrices under 266 nm pulsed laser irradiation is reported- Results show the electronically excited o(1D) atom may be formed in the primary photolysis step. In the N2 matrix, the highly active o(1D) atoms could either react with N2 lattice molecules forming N2O or recombine with nearby N2O forming cis-(NO)2 and trans-(NO)2. However, in the Ar matrix the nascent state o(1D) atom, due to the lack of reactant, quenches to O(3P) as moving through the lattice site and the yield of N2O is less than that in N2 matrix.
Keywords:Matrix isolation  Laser photodissociation  cis-(No)_2
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