首页 | 官方网站   微博 | 高级检索  
     

应用L-MBE方法制备ZnO薄膜的结构和光学特性
引用本文:张世玉,李清山,张立春,李平,马自侠,张志峰. 应用L-MBE方法制备ZnO薄膜的结构和光学特性[J]. 新技术新工艺, 2010, 0(12): 79-83
作者姓名:张世玉  李清山  张立春  李平  马自侠  张志峰
作者单位:[1]鲁东大学物理学院,山东烟台264025 [2]海军航空工程学院,山东烟台264001
基金项目:山东省自然科学基金,海军航空工程学院基础研究基金
摘    要:用激光分子束外延(Laser Molecular Beam Epitaxy,L-MBE)设备在p型Si(111)衬底上制备了不同衬底温度和不同氧压的ZnO薄膜,用X射线衍射仪(XRD)和原子力显微镜(AFM)分别对薄膜的结构和形貌进行了分析,用He-Cd激光(325nm)激发的光致发光测试系统对薄膜进行了荧光光谱分析。研究发现,在衬底温度为400℃,氧压1Pa左右所制备的ZnO薄膜表面比较均匀致密,晶粒生长较充分,有较高的结晶质量和发光强度。ZnO薄膜的近带边发射与薄膜的结晶质量和化学配比均有关系。

关 键 词:激光分子束外延  ZnO薄膜  结构特性  光致发光

The Structural and Optical Properties of ZnO Thin Films by L-MBE
ZHANG Shiyu,LI Qingshan,ZHANG Lichun,LI Ping,MA Zixia,ZHANG Zhifeng. The Structural and Optical Properties of ZnO Thin Films by L-MBE[J]. New Technology & New Process, 2010, 0(12): 79-83
Authors:ZHANG Shiyu  LI Qingshan  ZHANG Lichun  LI Ping  MA Zixia  ZHANG Zhifeng
Affiliation:1.Department of Physics,Ludong University,Yantai 264025,China;2.Naval Aeronautical Engineering Institute,Yantai 264001,China)
Abstract:ZnO films were fabricated on p-type Si(111) substrates by laser molecular beam epitaxy(L-MBE) at different substrate temperatures and different oxygen pressure.The structure and morphological properties of the films were investigated by X-ray diffraction(XRD) and atomic force microscope(AFM) measurements respectively.The optical properties of the films were studied by photoluminescence spectra using a 325 nm He-Cd laser.It was found that the film grew at the substrate temperature of 400 ℃ and the oxygen pressure of 1 Pa has a much smoother and denser morphology,ideal crystalline quality and better optical properties.Near the band edge emission of ZnO thin films are involved in the crystal quality and chemical ratios.
Keywords:L-MBE  ZnO thin film  Structural property  Photoluminescence
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号