| 热丝CVD生长金刚石薄膜研究 |
| |
| 引用本文： | 杨国伟 毛友德. 热丝CVD生长金刚石薄膜研究[J]. 光子学报, 1995, 24(2): 175-178 |
| |
| 作者姓名： | 杨国伟 毛友德 |
| |
| 作者单位： | 湘潭大学物理系，合肥工业大学应用物理系 |
| |
| 摘 要： | 本文研究了热丝CVD方法生长金刚石薄膜过程中,衬底表面的损伤处理对金刚石薄膜光学性能的影响,以及膜中非本征杂质吸收对其红外光学特性的影响。
|
| 关 键 词： | 热丝CVD 金刚石薄膜 |
| 收稿时间： | 1994-01-03 |
A STUDY OF DIAMOND THIN FILMS GROWTH BY HFCVD |
| |
| Yang Guowei. A STUDY OF DIAMOND THIN FILMS GROWTH BY HFCVD[J]. Acta Photonica Sinica, 1995, 24(2): 175-178 |
| |
| Authors: | Yang Guowei |
| |
| Affiliation: | 1. Physics depar. Xiangtan University, 411105;2. Dept.Appl.PHYS., HEFEI University of Technology, Hefei, 230009 |
| |
| Abstract: | We have studied that,in this paper,the effects of the handpolished surface of the substrateson structure of deposition films,in diamond thin films growth by HFCVD,and effects of non-intrinsicabsorption by impurities of deposition films on infrared optics transmittance of deposition films. |
| |
| Keywords: | HECVD Diamond thin film |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《光子学报》浏览原始摘要信息 |
|
点击此处可从《光子学报》下载全文 |
|
