基于PECVD方法制备的透明硅氧烷（SiOxCyHz）阻隔薄膜特性研究

柔性、透明的高阻隔性薄膜在有机太阳能薄膜电池、柔性有机发光二极管、电子纸和真空绝热板等领域都有需求。采用对电极辊结构的等离子体增强化学气相沉积方法,卷对卷的方式在聚酯(PET)基膜上,以硅醚(HMDSO)为单体,氧气(O₂)为反应气体,制备了柔性硅氧烷(SiOxCyHz)薄膜。研究了膜厚,氧气/单体比例、压力等参数对透水率(WVTR)的影响规律、测试了膜层的组分、透射光谱、应力等特性。研究结果表明,透水率随硅氧烷薄膜厚度增大而减小,随氧气/单体比例增大而减小,随压力减小而增大。500 nm厚的硅氧烷薄膜透水率低于5×10^-3g/(m²·day),可见光谱段(380-760 nm)透光率达到88.6%,表面粗糙度为1.8 nm,薄膜应力随薄膜厚度增加显著增大。

Properties of Transparent SiOxCyHz Barrier Film Prepared by PECVD

Flexible and transparent barrier films are in demand in the fields of organic solar thin-film cells,flexible organic light-emitting diodes,electronic paper and vacuum insulation boards.Flexible SiOxCyHz thin films were prepared on PET base films by the roll-to-roll method using HMDSO as monomer and O₂ as the reaction gas.SiOxCyHz thin films were prepared by plasma-enhanced chemical vapor deposition(PECVD)with a counter-electrode roller structure.The effects of film thickness,oxygen/monomer ratio and reaction vacuum on water permeability(WVTR)were studied.The composition,transmission spectrum and stress of the film were measured.The water permeability decreases with the increase of SiO CyHz film thickness,oxygen/monomer ratio,and decrease of pressure.When the thickness of SiOxCyHz film is 500 nm,the water permeability is lower than 5×10^-3g/(m²·day).The light transmittance(380-760 nm)of SiOxCyHz film reached 88.6%.The film surface was smooth,and the surface roughness was 1.8 nm.The stress of siloxane film increases significantly with the increase of thickness.