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MOVPE growth of strained InGaAs/lnAIAs MQWs for a polarization-insensitive electroabsorption modulator
Authors:S Kondo  K Wakita  Y Noguchi  N Yoshimoto  M Nakao  K Nakashima
Affiliation:(1) NTT Optoelectronics Laboratories, 3-1, Morinosato, Wakamiya, Atsugi, 243-01 Kanagawa, Japan
Abstract:Metalorganic vapor phase epitaxial growth of a strained InGaAs/lnAIAs multiquantum well (MQW) structure was carried out for optical electroabsorption modulators. A high-quality MQW layer can be grown by introducing compressive strain into InAlAs barrier layers against tensile-strained well layers. We have also demonstrated strained InGaAs/lnAIAs MQW electroabsorption modulators with polarization insensitivity by using these layers and have obtained a highquality modulator with a low driving voltage of 1.7 V and a wide 3-dB bandwidth of over 20 GHz.
Keywords:InGaAs/lnAIAs  metalorganic vapor phase epitaxy (MOVPE)  modulator  multi-quantum well (MQW)  polarization-insensitive  strained MQW
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