Optical emission spectroscopy as a real time diagnostic tool for plasma-assisted deposition of TiN

Real-time optical emission spectroscopy (OES) was used to monitor the deposition of TiN both from mixtures of tetrakis(dimethylamino)titanium (TDMATi)-N₂ and TiCl₄-H₂-N₂ in an electron cyclotron resonance chemical vapor deposition system. The accurate control of the ratio of the emission intensities of ionized nitrogen at 391.4 nm and molecular nitrogen at 357.7 nm (N ₂ ⁺ /N₂) led to low temperature deposition of stoichiometric TiN (Ti/N ≈ 1) and very low resistivity in both cases. It was found that high ion density plasmas are crucial for a considerable reduction of the deposition temperature while maintaining good film quality. OES shows that the abundance of certain excited plasma species is not only dependent on the gas mixture and the deposition parameters, such as total pressure and microwave power, but also is strongly affected by the magnetic field configuration. The deposition rate and the film resistivity can be related to the emission intensity ratio, I(N ₂ ⁺ )/I(N₂). Finally, the two processes are compared in terms of the quality of as-deposited and heat-treated films. The comparison shows that the films obtained with TDMATi exhibit lower resistivity and are thermally more stable than with TiCl₄.     

All Solid‐State pH Electrode Based on Titanium Nitride Sensitive Film

Titanium nitride was used as pH‐sensitive material to fabricate all solid‐state pH electrode. The fabrication and the response performance of the pH electrode were described in the paper. The TiN film electrode showed a linear response in the pH range of 2–12 with a near‐Nenstian response (?55 mV/pH). The response time was within 1 min, and the electrode had good reproducibility, stability and low sensitivities for different species. Compared with the glass pH electrode, the electrode exhibited some advantages, for example, without activation, rapid response and high mechanical strength. In addition, the electrode performed excellently in a corrosion medium containing F^?(1 M). Electrochemical behaviors of TiN electrode in Britton‐Robinson buffers were studied with Electrochemical Impedance Spectroscopy (EIS).     

In-Situ Synthesis and Characterization of Nanocomposites in the Si-Ti-N and Si-Ti-C Systems

The pyrolysis (1000 °C) of a liquid poly(vinylmethyl-co-methyl)silazane modified by tetrakis(dimethylamido)titanium in flowing ammonia, nitrogen and argon followed by the annealing (1000–1800 °C) of as-pyrolyzed ceramic powders have been investigated in detail. We first provide a comprehensive mechanistic study of the polymer-to-ceramic conversion based on TG experiments coupled with in-situ mass spectrometry and ex-situ solid-state NMR and FTIR spectroscopies of both the chemically modified polymer and the pyrolysis intermediates. The pyrolysis leads to X-ray amorphous materials with chemical bonding and ceramic yields controlled by the nature of the atmosphere. Then, the structural evolution of the amorphous network of ammonia-, nitrogen- and argon-treated ceramics has been studied above 1000 °C under nitrogen and argon by X-ray diffraction and electron microscopy. HRTEM images coupled with XRD confirm the formation of nanocomposites after annealing at 1400 °C. Their unique nanostructural feature appears to be the result of both the molecular origin of the materials and the nature of the atmosphere used during pyrolysis. Samples are composed of an amorphous Si-based ceramic matrix in which TiN_xC_y nanocrystals (x + y = 1) are homogeneously formed “in situ” in the matrix during the process and evolve toward fully crystallized compounds as TiN/Si₃N₄, TiN_xC_y (x + y = 1)/SiC and TiC/SiC nanocomposites after annealing to 1800 °C as a function of the atmosphere.     

不锈钢管道低温溅射镀TiN薄膜技术

 设计了一套适用于加速器细长管道真空室的低温溅射镀TiN薄膜装置。利用该装置，对86 mm×2 000 mm的不锈钢管道真空室进行溅射镀TiN膜实验，并对镀膜实验结果进行分析，得到了适用于加速器管道真空室内壁溅射镀TiN膜的表面处理参数。样品测试结果表明：在压强为80～90 Pa、基体温度为160~180 ℃的镀膜参数下，不锈钢管道内壁获得的TiN薄膜最佳，薄膜沉积速率为0.145 nm/s。镀膜后真空室的二次电子产额明显降低。     

Characterization of bilayer coatings of TiN/ZrN grown using pulsed arc PAPVD

Nitride coatings have been used to increase hardness and to improve the wear and corrosion resistance of structural materials. Coatings of TiN/ZrN were grown on stainless steel substrates using a physical vapour deposition system assisted by pulsed arc plasma (PAPVD). The coatings have been characterized by X-ray diffraction (XRD) in order to identify the present phases of the films, microstrain level generated, crystallite size and the variation of the lattice parameter. The results showed plane orientations (1 1 1) and (2 0 0) in both TiN and ZrN films. Morphology surface analysis of the samples were performed using a scanning probe microscope to characterize the grain size and roughness in the mode of the atomic force microscopy (AFM) hence it was observed that the root-mean-squared (rms) roughness for ZrN is smaller than for TiN. Besides elastic and friction properties of the films were characterized qualitatively, and then, they were compared with those of the substrates by using force modulation microscopy (FMM) and lateral force microscopy (LFM) modes. In addition, an elemental analysis of the samples was realized by means of energy dispersive spectroscopy (EDS). Both, XRD and AFM results are given as a function of the number of shots. Chemical states of the TiN and ZrN films were determined by X-ray photoelectron spectroscopy (XPS).     

Effects of pulsed bias duty ratio on microstructure and mechanical properties of TiN/TiAlN multilayer coatings

TiN/TiAlN multilayer coatings were deposited on M2 high speed steel by a pulsed bias arc ion plating system. The effect of pulsed bias duty ratio on the microstructure, mechanical and wear properties was investigated. The amount of macroparticles reduced with the increase of the duty ratio. The surface roughness was 0.0858 μm at duty ratio of 50%. TiN/TiAlN multilayer coatings were crystallized with orientations in the (1 1 1), (2 0 0) (2 2 2) and (3 1 1) crystallographic planes and the microstructure strengthened at (1 1 1) preferred orientation. At duty ratio of 20%, the hardness of TiN/TiAlN multilayer coatings reached a maximum of 3004 HV, which was 3.2 times that of the substrate. The adhesion strength reached a maximum of 77 N at 50% duty ratio. Friction and wear analyses were carried out by pin-on-disc tester at room temperature. Compared with the substrate, all the specimens coated with TiN/TiAlN multilayer coatings exhibited better tribological properties.     

Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating

Thin films of titanium nitride (TiN) were deposited on stainless steel substrates by a modified deposition technique, double-layered shielded arc ion plating with vicarious circular holes (DL-SAIP). The results show that the TiN film with the distance of 10 mm between the double-layered shield plates had the least droplets. The deposition rate of the films prepared with the new technique was more homogeneous than that of all the other shielded arc ion plating. The film/substrate adhesion and microhardness values of the TiN films were higher than 40 N and 18 GPa, respectively. Thus such TiN thin films can be expected in applications.     

The effect of heat treatment on the electrochemical corrosion behavior of reactive plasma-sprayed TiN coatings

The effect of heat treatment on the corrosion behavior of reactive plasma sprayed TiN coatings in simulated seawater was investigated by electrochemical methods such as the corrosion potential-time curve (E_corr − t), potentiodynamic polarization, electrochemical impedance spectroscopy (EIS) and SEM, etc. The results showed that the corrosion potential of TiN coatings increased after heat treatment; the corrosion current of the TiN coatings after heat treatment (be hereafter referred to as HT-TiN) was 13.3% of the untreated coatings (be hereafter referred to as UT-TiN), and the polarization resistance of HT-TiN was 20 times of UT-TiN, which indicated that the heat treatment had significantly increased the corrosion resistance of the coatings. The corrosion behavior of the coatings was mainly local corrosion, and the local corrosion behavior mainly took place at the microdefects (crack and pores) of the coatings. The porosity of the coatings was reduced after heat treatment. The reason was that TiN reacted with O₂ to form TiO₂ and Ti₃O during the heat treating, and volume expansion took place, which led to denser microstructure. The corrosion resistance of the coatings was therefore increased.     

The influence of compressive stress applied by hard coatings on the power loss of grain oriented electrical steel sheet

To reduce the core loss of electrical steel the vacuum arc ion plating technique has been used to deposit titanium nitride (TiN) layers on highly grain oriented electrical steel sheets. The layer thickness, the stresses of layers and coated sheets and the achieved reduction in core losses have been measured as functions of coating duration and applied bias voltage. Well adhered layers with high compressive stress up to 6.8 GPa have been produced. With increasing bias voltage the layer thickness decreases and the intrinsic stress of the layers increase. A further increase of bias voltage leads to a drop in stress due to thermal relaxation. In general, the tensile stress of the coated sheets rises with increasing layer thickness while the core loss of the coated material decreases with increasing tensile stress of the steel sheet and increasing bias voltage. The highest reduction of core loss has been found to be 28% (from P_1.7=0.86 W/kg for commercially coated HGO electrical steel sheet with glass film to 0.62 W/kg for TiN coated material) and is due to the reduction of excess loss only.     

Chemical stability of TiN,TiAlN and AlN layers in aggressive SO2 environments

In this paper, we have studied, using X‐ray photoelectron spectroscopy (XPS), the chemical stability of TiN, TiAlN and AlN layers produced by magnetron sputtering on Si wafer substrates, against humid, SO₂‐polluted atmospheres. The results have indicated that the TiN layers suffer almost no degradation after seven days of exposure to the aggressive environment. The degradation of the TiAlN layers is small, and this is evidenced by the appearance of signals corresponding to N? O bonds in the N 1s spectra, after seven days of exposure to the corrosive atmosphere and the increase in the Ti 2p spectra of the contribution corresponding to TiO₂. In contrast, the degradation experienced by the AlN layers is quite large. The spectra reveal dramatic changes after just one day of exposure to the aggressive conditions. This is related to the preferential growth of the AlN layers, which gives rise to an open, columnar structure. Copyright © 2005 John Wiley & Sons, Ltd.