排序方式: 共有2条查询结果,搜索用时 0 毫秒
1
1.
DeBrosse J. Gogl D. Bette A. Hoenigschmid H. Robertazzi R. Arndt C. Braun D. Casarotto D. Havreluk R. Lammers S. Obermaier W. Reohr W.R. Viehmann H. Gallagher W.J. Muller G. 《Solid-State Circuits, IEEE Journal of》2004,39(4):678-683
A 128-kb magnetic random access memory (MRAM) test chip has been fabricated utilizing, for the first time, a 0.18-/spl mu/m V/sub DD/=1.8 V logic process technology with Cu metallization. The presented design uses a 1.4-/spl mu/m/sup 2/ one-transistor/one-magnetic tunnel junction (1T1MTJ) cell and features a symmetrical high-speed sensing architecture using complementary reference cells and configurable load devices. Extrapolations from test chip measurements and circuit assessments predict a 5-ns random array read access time and random write operations with <5-ns write pulse width. 相似文献
2.
Reohr W. Honigschmid H. Robertazzi R. Gogl D. Pesavento F. Lammers S. Lewis K. Arndt C. Yu Lu Viehmann H. Scheuerlein R. Li-Kong Wang Trouilloud P. Parkin S. Gallagher W. Muller G. 《Circuits and Devices Magazine, IEEE》2002,18(5):17-27
With the promise of nonvolatility, practically infinite write endurance, and short read and write times, magnetic tunnel junction magnetic random access memory could become a future mainstream memory technology. 相似文献
1