排序方式: 共有19条查询结果,搜索用时 15 毫秒
1.
对使用等离子体增强化学汽相沉积(PECVD)法在不同淀积条件下制备的非晶硅(a-Si:H)、微晶硅(μc-Si:H)和纳米硅(nc-Si:H)薄膜在200—600℃温度范围进行常规退火研究。用共振核反应技术测量了样品中氢含量C_H值及退火对氢含量及其分布的影响。通过室温下对暗电导率的测量得到退火对nc-si:H薄膜电导率的影响,并与a-Si:H,μc-Si:H薄膜的退火行为作了比较。使用紫外/可见/近红外分光光度计对样品透射率进行了测量,分析计算得到了退火温度T_a与ac-Si:H薄膜光学带隙E_g~(o
关键词: 相似文献
2.
提出了一种无须进行电离积分的用于高压结终端模拟的边界元素法,分析了界面电荷对FP-JTE终端结构击穿电压的影响,结果表明击穿电压几乎与界面电荷浓度呈线性关系,场板可减弱界面电荷对击穿电压的影响。 相似文献
3.
一种求解透明薄膜椭偏方程的新方法 总被引:1,自引:1,他引:0
介绍用测量得到的椭偏参数ψ和Δ求解透明薄膜折射率和厚度的方法。该方法引入一个新的目标求解函数,减少了搜索参量的空间的维数,改善了函数的性态和收敛速度,缩短了计算时间。最后给出应用实例。 相似文献
4.
Heavily C-doped GaAs films, grown by metalorganic chemical vapor deposition with CCl4 as external carbon source, have been studied by Hall-effect measurements, high-resolution double-crystal X-ray diffraction, and secondary-ion-mass spectroscopy (SIMS). Comparison among X-ray diffraction and Hall-effect measurements and SIMS results indicates that carbon is preferentially incorporated as acceptor on As lattice sites and electrical activation rate achieves 100%. There is no evidence of carbon incorporated on Ga sites as donors and incorporated on interstitial lattice sites. 相似文献
5.
6.
The dependence of the excitonic lifetime on the well width has been studied in conventional GaAs/AlGaAs quantum wells. Two clearly different variations of the measured excitonic lifetime have been observed. For wide well widths, we find a nearly linear decrease of the lifetime with decreasing well width. However, when the well is further decreased, a saturation and even increase of the lifetime with decreeing well width are observed. The experimental data are compared with the theory of radiative excitonic recombination, and show that well width dependence of the measured photoluminescence lifetime can be attributed mainly to the change of the excitonic effective volume and the overlap integral as well. 相似文献
7.
较为系统地研究了掺碳p型GaAs和InGaAs的金属有机物分子束外延(MOMBE)生长特性和电学特性。结果表明,衬底温度和分子束强度等生长条件对于样品的生长速率、空穴浓度及In组分含量等具有较大的影响,在InGaAs的生长中这种影响更为强烈。根据对实验结果的分析,可以认为,作为分子束源之一的TMGGa(CH3)3,trimethylgallium,三甲基镓的分解状态与生长条件的相关性,是引起生长速率和空穴浓度等变化的主要因素。
关键词: 相似文献
8.
9.
10.