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Effect of Rare Earth Element Cerium on Mechanical Properties and Morphology of TiN Coating Prepared by Arc Ion Plating 总被引:7,自引:0,他引:7
TiN coatings were deposited on polished substrates of W18Cr4V high speed steel by means of vacuum arc ion plating. The effect of cerium on adhesion between TiN coating and substrate was studied. The microstructures and composition of TiN coatings were also investigated by means of scanning electron microscope (SEM), Auger electron spectroscopy (AES), and X-ray diffraction (XRD) technique. It was found that cerium is an effective modifying agent and the addition of suitable amount of cerium to TiN coatings can produce relatively excellent properties such as micro-hardness, wear resistance, oxidation resistance and porosity. The experimental results show that the added cerium in TiN coatings makesa contribution to form the preferred direction along with a (111 ) or (222) close packed face, which may be one of the reasons that improves some properties mentioned above. 相似文献
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对中间相炭微球(MCMB)进行改性,以改性MCMB(M-MCMB)为基体、柠檬酸为碳源,由化学还原法、球磨法及热裂解工艺制得Sn Sb Cu0.5/M-MCMB/C复合材料。用XRD、SEM及恒流充放电等方法研究样品、纯Sn Sb Cu0.5合金和Sn Sb Cu0.5/M-MCMB负极材料。Sn Sb Cu0.5/M-MCMB/C复合材料可缓解纯Sn Sb Cu0.5合金的体积膨胀效应,提高循环稳定性。以100 m A/g在0.01~2.00 V循环,首次放电比容量为648.51 m Ah/g,库仑效率为74.55%,第80次循环的容量保持率为80.26%。 相似文献
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TC11钛合金表面电弧离子镀TiAlN涂层防护性能的研究 总被引:8,自引:0,他引:8
利用电弧离子镀技术在TC11钛合金基体上沉积TiAlN涂层。采用扫描电子显微镜(SEM)、X射线衍射仪(XRD)等方法对比分析了钛合金基体和涂层氧化前后的表面形貌、物相结构。采用X射线光电子能谱仪(XPS)对TiAlN涂层性能进行了分析,研究了基体和镀膜的耐磨性。结果表明,TiAlN涂层显著改善了钛合金的粘着磨损性及高温抗氧化性,在空气中650℃静态氧化100h后,TiAlN涂层依然保持良好的状态和抗磨损性能。 相似文献
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离子束加速电压对真空电弧沉积Ti(C,N)涂层性能的影响 总被引:2,自引:0,他引:2
利用等离子辅助真空电孤沉积技术分别在高速钢片和单晶硅片制备了Ti(C,N)涂层,通过X-射线衍射和扫描电镜研究了不同离子加速电压对单晶硅片上涂层结构和组织形貌的影响,并测定了高速钢片上涂层的显微硬度,同时进行了耐磨性实验。结果表明:涂层主要由TiN和Ti(C,N)组成,随着离子束加速电压的增大,涂层的沉积速度增大,Ti(C,N)的衍射峰不断宽化,晶格尺寸发生变化,但其表面形貌不受影响;当离子束加速电压为1500V时,涂层有较高的耐磨性和显微硬度,当离子束加速电压为2500V时,涂层的耐磨性和显微硬度都有所下降: 相似文献
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