高频LLC谐振变换器的节能降损研究

为了高频LLC谐振变换器达到节能降损的目的,论文建立了确定器件和逻辑链路控制(LLC)谐振变换器设计参数对器件和变压器绕组损耗的影响,量化了氮化镓高电子迁移率晶体管(GaN HEMT)对降低转换器损耗的益处.器件损耗主要是由器件的传导电阻和转换器RMS电流所决定的传导损耗.RMS电流随着不同的励磁电流和死区时间组合而变...     

蓝宝石衬底的斜切角对GaN薄膜特性的影响

利用金属有机物化学气相沉积技术在具有斜切角度的蓝宝石衬底(0～0.3°)上生长了非故意掺杂GaN薄膜,并采用显微镜、X射线双晶衍射、光荧光及霍尔技术对外延薄膜的表面形貌、晶体质量、光学及电学特性进行了分析.结果表明,采用具有斜切角度的衬底,可以有效改善GaN外延薄膜的表面形貌、降低位错密度、提高GaN的晶体质量及其光电特性,并且存在一个衬底最优斜切角度0.2°,此时外延生长出的GaN薄膜的表面形貌和晶体质量最好.     

微波固态器件与单片微波集成电路技术的新发展

对不同时代的单片微波集成电路(MMIC)的器件工艺发展和应用发展状况进行概况总结,并结合当前的研究与应用热点,重点分析以砷化镓(GaAs)、氮化镓(GaN)为代表的微波化合物固态器件和基于MMIC的异构异质集成新技术路径,并就今后发展的趋势做出展望.     

InGaN/GaN多量子阱蓝光LED的p-GaN盖层的MOCVD生长研究

利用金属有机物化学气相淀积（MOCVD）生长了InGaN／GaN多量子阱（MQW）蓝光发光二极管（LED）,研究了不同Cp2Mg流量下生长的p-GaN盖层对器件电学特性的影响。结果表明,随着Cp2Mg流量的提高,漏电流升高,并且到达一临界点会迅速恶化;正向压降则先降低,后升高。进而研究相同生长条件下生长的p-GaN薄膜的电学特性、表面形貌及晶体质量,结果表明,生长p-GaN盖层时,Cp2Mg流量过低,盖层的空穴浓度低,电学特性不好;Cp2Mg流量过高,则会产生大量的缺陷,盖层晶体质量与表面形貌变差,使得空穴浓度降低,电学特性变差。因此,生长p-GaN盖层时,为使器件的正向压降与反向漏电流均达到要求,Cp2Mg流量应精确控制。     

低速高电荷态重离子在GaN单晶中引起的辐照损伤研究

利用Rutherford沟道背散射分析研究了低速高电荷态重离子(Xe26 )在氮化镓(GaN)晶体中辐照损伤的产生对剂量的依赖关系,比较了垂直照射和60°倾斜照射的差异.基于"库仑爆炸"模型对结果进行了解释.     

Fabrication of hexagonal gallium nitride films on silicon (111) substrates

Hexagonal gallium nitride films were successfully fabricated through ammoniating Ga2O3 films deposited on silicon (111) substrates by electrophoresis. The structure, composition, and surface morphology of the formed films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). The measurement results reveal that the polycrystalline GaN films with hexagonal wurtzite structure were successfully grown on the silicon (111) substrates. Preliminary results suggest that varying the ammoniating temperature has obvious effect on the quality of the GaN films formed with this method.     

粒状氮化镓微晶的合成及其结构性能的研究

在950℃的氮化温度下,通过单氢氧化镓（GaO2H）粉末与流动的NH3反应35 min制备出粒状GaN微晶.通过X射线衍射（XRD）和扫描电镜（SEM）研究发现,GaN粉末是六角纤锌矿结构的粒状微晶,其晶格常数a和c分别为0.3191 nm和0.5192 nm.X射线光电子能谱（XPS）揭示试样中有Ga-N键形成,Ga与N两元素比为1∶1.     

喷淋式GaN-MOCVD反应室的CFD数值仿真及优化

利用计算流体力学(CFD)方法对某型立式喷淋式金属有机物化学气相沉积(MOCVD)反应室流场进行了三维数值仿真,研究了影响MOCVD反应室流场结构的各工作参数(流量、温度、压力)的作用机制,并对试制中的MOCVD设备的几何结构及进气方式进行了改进,采用了圆弧形过渡拐角及泊肃叶型入口速度剖面,以形成稳定均匀的流场,从而保证氮化镓(GaN)的生长质量。     

Photoluminescence and photoluminescence excitation studies in 80 MeV Ni ion irradiated MOCVD grown GaN

We report damage creation and annihilation under energetic ion bombardment at a fixed fluence. MOCVD grown GaN thin films were irradiated with 80 MeV Ni ions at a fluence of 1 × 10¹³ ions/cm². Irradiated GaN thin films were subjected to rapid thermal annealing for 60 s in nitrogen atmosphere to anneal out the defects. The effects of defects on luminescence were explored with photoluminescence measurements. Room temperature photoluminescence spectra from pristine sample revealed presence of band to band transition besides unwanted yellow luminescence. Irradiated GaN does not show any band to band transition but there is a strong peak at 450 nm which is attributed to ion induced defect blue luminescence. However, irradiated and subsequently annealed samples show improved band to band transitions and a significant decrease in yellow luminescence intensity due to annihilation of defects which were created during irradiation. Irradiation induced effects on yellow and blue emissions are discussed.     

压电半导体的极化处理及性能研究

极化处理是压电半导体材料制备及构件设计中的关键工艺,直接影响着其压电性能。根据夹层极化的方法,研制出一种多样性极化实验装置,解决了压电半导体的极化问题,并对极化后的GaN材料性能进行了系统研究。实验结果表明:(1)极化使GaN材料具备了压电性能,改变了其力电性能参数;(2)极化显著提高了压电半导体的导电能力,改变了其弯曲强度。