聚苯并咪唑金属复合物的X-射线光电子能谱(XPS)研究

本文报道以聚苯并咪唑(PBI)与某些过渡金属卤化物所形成的金属复合物的XPS研究,由反映在金属复合物N_(1s)和C_(1s)振起(Shake-up)伴峰的消失,反映在PBI中N_(1s)双峰变为复合物中的具有高结合能的单峰以及与其复合金属离子结合能的降低,这就从施受两个侧面确证金属复合物的形成。XPS结果也说明在金属复合物的制备中,不同溶剂条件所制得的复合物在硅氢加成中活性丧失归结於溶剂导致的金属离子的还原。     

WOx/TiO2光催化剂的可见光催化活性机理探讨

采用磁控溅射技术在用浸渍提拉法制得的TiO2薄膜上，溅射氧化钨层,通过气相反应中光催化降解二甲苯的实验表明，WOx/TiO2薄膜具有可见光活性.通过UV-Vis吸收光谱、X射线光电子能谱（XPS）等方法对其可见光活性的机理进行探索.UV-Vis吸收光谱表明WOx,TiO2对可见光响应的范围有一定的扩展,吸收强度增加.XPS表明WOx/TiO2薄膜表面形成了明显的W杂质能级和Ti缺陷能级,这是WOx/TiO2在可见光范围有一吸收的主要原因,也是光催化剂具有可见光活性的必要条件之一，同时杂质能级的存在使半导体费米能级上移,载流子增加,光催化效率提高.     

电化聚合聚吡咯的角分布X射线光电子能谱研究

用角分布Ｘ射线光电子能谱（ＸＰＳ）测试和样品原位加热相结合的方法研究了阴离子是对甲苯磺酸根的电生导电聚吡咯的化学和聚集态结构．其结果表明聚吡咯表面约几个原子层内原子的相对浓度依下述次序递减：Ｃ＞Ｏ＞Ｓ＞Ｎ；导电聚吡咯中的氮原子至少有吡咯氮和氧化态氮两种；在２００℃加热以后聚合物链不受影响，但阴离子向表面迁移，同时氧化态氮大大减少．     

平朔气煤的煤岩显微组分结构研究

用显微光度计、扫描电子显微镜(SEM)、傅立叶变换红外光谱(FTIR)、X射线衍射光谱(XRD)和X光电子能谱(XPS)等测试手段研究了平朔气煤的等密度梯度离心分离(DGC)显微组分富集物的结构。结果表明,镜质组和稳定组结构相似,含氧基团基本相同,但丝质组结构则不同,它含有较多的羧基和羰基。根据实验结果讨论了三种显微组分的大分子结构,认为它们是由许多结构相似而又不相同的结构单元所构成。镜质组和稳定组的单元核心主要为脂环、缩聚芳环,环数为5—6个;丝质组单元核心主要为缩聚芳环,环数为7—8个,环缩合程度最高,芳香层片在空间排列规则,相互定向程度大。     

高碲酸合铜（Ⅱ,Ⅲ）配合物的合成和性质

在Ｈ６ＴｅＯ６／ＫＯＨ水溶液中以臭氧为氧化剂，将二价铜化合物氧化成三价铜化合物，并获得一个新的三价铜化合物Ｂａ４Ｋ［Ｃｕ（Ｈ２ＴｅＯ６）２］（ＯＨ）４．６Ｈ２Ｏ；描述了碱性溶液中“Ｃｕ（Ⅲ）／Ｃｕ（Ⅲ）”循环伏安图。对铜（Ⅲ）化合物，Ｎａ４Ｈ［Ｈ２ＴｅＯ６）２］．１７Ｈ２Ｏ以及相应的铜（Ⅱ）配合物的电子光谱和Ｃｕ２ｐＸＰＳ进行了研究，给出了其配位场场强参数和Ｃｕ２ＰＸＰＸ的电子结合能。由于价态升高     

XPS,AFM, ATR and TPD evidence for terraced,dihydrogen terminated, 1×1 (100) silicon

Heating (100) silicon at high temperature (say, higher than 850 °C) in H₂, cooling to 670–700 °C in the same ambient, and quenching to room temperature in N₂ results in environmentally robust, terraced 1 × 1 (100) SiH₂. Evidence for this conclusion is based on angle‐resolved x‐ray photoelectron spectroscopy, atomic force microscopy, infrared absorption spectroscopy in the attenuated total reflection mode, thermal programmed desorption, and reflection high‐energy electron diffraction. Copyright © 2005 John Wiley & Sons, Ltd.     

Summary of ISO/TC 201 standard: XXI. ISO 21270:2004—Surface chemical analysis—X‐ray photoelectron and Auger electron spectrometers—Linearity of intensity scale

This International Standard specifies two methods for determining the maximum count rate for an acceptable limit of divergence from linearity of the intensity scale of Auger and x‐ray photoelectron spectrometers. It also includes methods to correct for intensity non‐linearities so that a higher maximum count rate can be employed for those spectrometers for which the relevant correction equations have been shown to be valid. Copyright © 2004 John Wiley & Sons, Ltd.     

轻希土硫氰酸盐与2,3,11,12,-四苯基-1,4,7,10,13,16-六氧-2,11-十八环二烯配合物的合成及XPS研究

合成了六种轻希土硫氰酸盐与标题不饱和冠醚的新固体配合物,进行了元素分析,摩尔电导率、DTA、UV、IR和XPS等表征。对Ln(NCS)_3·L和Ln(NCS)_3的XPS研究中,得到它们组成原子芯能级电子(Ln3d_(5/2),Ols,Nls,S2p)的结合能信息;观察到除Y3d_(5/2)外Ln3d_(5/2)(Ln=La、Ce、Pr、Nd、和Sm)的伴峰结构,Ln3d_(5/2)结合能与原子序数呈线性关系,并推断类似化合物Pm3d_(5/2)结合能在1035eV附近.     

XPS and AES characterization of hydrolysed γ‐mercaptopropyltrimethoxysilane deposited on Al,Zn and Al–43.4Zn–1.6Si alloy‐coated steel

In this paper Al, Zn and Al–43.4Zn–1.6Si (AlZn) alloy‐coated steel have been treated with the organofunctional silane γ‐mercaptopropyltrimethoxysilane (γ‐MPS). The influence of different metal substrates on the structure and composition of the silane films was investigated with XPS and AES. The films were obtained by dipping the substrates in the silane solution followed by a blow‐dry procedure in nitrogen gas. The results show that the surface concentration of the deposited silane is independent of the metal substrate and that the thickness of the silane film is non‐uniform. The AES measurements indicate that the silane film covers the entire substrate surface and XPS analysis of the silane‐treated substrate surfaces at different take‐off angles indicates that the γ‐MPS molecule is randomly orientated. Also, the results show that the silane is well hydrolysed under the solution conditions used. Finally, in the zinc‐containing silane‐metal systems, i.e. the silane‐treated AlZn and Zn substrates, the results indicate that the γ‐MPS molecules can bond to the substrate surfaces via the thiol group of the molecule. Copyright © 2004 John Wiley & Sons, Ltd.