A new soft X-ray magnetic circular dichroism facility at the BSRF beamline 4B7B

X-ray magnetic circular dichroism (XMCD) has become an important and powerful tool because it allows the study of material properties in combination with elemental specificity, chemical state specificity, and magnetic specificity. A new soft X-ray magnetic circular dichroism apparatus has been developed at the Beijing Synchrotron Radiation Facility (BSRF). The apparatus combines three experimental conditions: an ultra-high-vacuum environment, moderate magnetic fields and in-situ sample preparation to measure the absorption signal. We designed a C-type dipole electromagnet that provides magnetic fields up to 0.5 T in parallel (or anti-parallel) direction relative to the incoming X-ray beam. The performances of the electromagnet are measured and the results show good agreement with the simulation ones. Following film grown in situ by evaporation methods, XMCD measurements are performed. Combined polarization corrections, the magnetic moments of the Fe and Co films determined by sum rules are consistent with other theoretical predictions and experimental measurements.     

nm量级薄膜厚度测量

 为了获得nm量级薄膜样品的精确厚度,采用软X射线反射率拟合方法、Bragg衍射方程方法和反射率Fourier变换方法分析了常规Cu靶X射线衍射数据及软X射线反射率数据。对厚度测量结果进行比较,3种方法得到的结果一致性很好。其中,软X射线反射率拟合和Bragg衍射方程方法精度很高,优于1 nm,Fourier变换方法精度稍低。对于单层W薄膜样品,3种方法获得厚度分别为(15.21±0.60) nm,(14.0±1.0) nm和(13.8±1.5) nm;对于双层W/C薄膜样品,W层厚度分别为(12.64±0.60) nm,(13.0±1.0) nm和(13.9±1.5) nm。这3种方法测量结果精度主要取决于反射率数据测量精度,而Fourier变换方法精度随着能量升高而提高,随着掠入射角范围增大而提高。     

磁控溅射法制备极紫外6.8～11.0nm波段Mo/B_4C横向梯度多层膜（英文）

用直流磁控溅射法结合掩模板控制膜厚的方法在Si衬底上制备了工作于6.8～11.0nm波段的[Mo/B_4C]60横向梯度多层膜。利用X射线掠入射反射测试以及同步辐射反射率测试对梯度多层膜的结构及性能进行了测试。X射线掠入射反射测试结果表明,多层膜周期厚度沿着长轴方向从4.39nm逐渐增加到7.82nm,周期厚度平均梯度为0.054nm/mm。对横向梯度多层膜沿长轴方向每隔5mm进行了一次同步辐射反射率测试,结果显示,横向梯度多层膜在45°入射角下的反射率约为10%,反射峰的半高全宽介于0.13nm到0.31nm之间。