Synthesis of poly(urethane-urea) varnish bearing azobenzene chromophoric pendants

A new diol with azoaromatic pendant was prepared by N-phenyl-4-amido-3,4-dichloromaleimide with 2-mercaptoethanol in the presence of NaOH, and used to obtain photosensible poly(urethane-urea) varnish. A poly(urethane-urea) varnish bearing azobenzene chromophores, based on a poly(ethylene adipate)diol (average molecular weight—2000), 4,4′-dibenzyldiisocyanate, diethylene glycol, trimethylolpropane, and afore-mentioned diol, were prepared and characterized. The polymers were characterized by FTIR spectroscopy, thermal analysis (DMA, DSC, and TGA), and the photochromic behavior by UV irradiation of thin films was discussed.     

Microstructure and flow behaviour during backward extrusion of semi-solid 7075 aluminium alloy

The microstructure and flow behaviour during thixo backward extrusion of 7075 aluminium alloy were investigated. Reheating the steel die and the aluminium billet placed into the die at the same time using an induction furnace provides rapidly a very homogeneous microstructure suitable for thixoforming. During thixoextrusion, despite the high solid fraction, the solid globules are weakly connected and slide over each other without any plastic deformation. The flow remains quasi homogeneous resulting in homogeneous induced microstructure of the component.     

Molds and Resists Studies for Nanoimprint Lithography of Electrodes in Low-Voltage Polymer Thin-Film Transistors

A low-cost patterning of electrodes was investigated looking forward to replacing conventional photolithography for the processing of low-operating voltage polymeric thin-film transistors. Hard silicon, etched by sulfur hexafluoride and oxygen gas mixture, and flexible polydimethylsiloxane imprinting molds were studied through atomic force microscopy (AFM) and field emission gun scanning electron microscopy. The higher the concentration of oxygen in reactive ion etching, the lower the etch rate, sidewall angle, and surface roughness. A concentration around 30 % at 100 mTorr, 65 W and 70 sccm was demonstrated as adequate for submicrometric channels, presenting a reduced etch rate of 176 nm/min. Imprinting with positive photoresist AZ1518 was compared to negative SU-8 2002 by optical microscopy and AFM. Conformal results were obtained only with the last resist by hot embossing at 120 °C and 1 kgf/cm² for 2 min, followed by a 10 min post-baking at 100 °C. The patterning procedure was applied to define gold source and drain electrodes on oxide-covered substrates to produce bottom-gate bottom-contact transistors. Poly(3-hexylthiophene) (P3HT) devices were processed on high-κ titanium oxynitride (TiO _x N _y ) deposited by radiofrequency magnetron sputtering over indium tin oxide-covered glass to achieve low-voltage operation. Hole mobility on micrometric imprinted channels may approach amorphous silicon (～0.01 cm²/V s) and, since these devices operated at less than 5 V, they are not only suitable for electronic applications but also as sensors in aqueous media.     

Formation of a crystallization courtyard in eutectic systems and crystal growth

The so-called crystallization courtyard is investigated that forms in processes of mass crystallization around the Ge and Si crystals and their solid solutions (Ge+Si) during cooling of hypereutectic alloys in the Ge-Al, Si-Al, and (Ge+Si)-Al eutectic systems. For the first time, data on the composition and microhardness of this crystallization courtyard are given and its role is shown as a stopper of cracking in an Al-(Ge,Si) system during rapid cooling after the heating system is turned off. For the first time, it is suggested that a crystallization courtyard forms in all hypereutectic systems (including every system in which the amount of the taken solvent does not correspond to the eutectic point).     

Biochemical characterisation and application of lipases produced by Aspergillus sp. on solid‐state fermentation using three substrates

Lipase from Aspergillus sp. obtained by solid‐state fermentation (SSF) on wheat bran (LWB), soybean bran (LSB) and soybean bran combined with sugarcane bagasse (LSBBC) were 67.5, 58 and 57.3 U of crude lipase per gram substrate, respectively. The optimum pH of activity and stability of the LWB was between 8 and 9, and the optimum temperature of activity and stability was 50 °C and up to 60 °C, respectively. The LSB and LSBBC showed two peaks of optimum pH (4 and 6) and optimal values of temperature and stability at 50 °C. The LSB was stable in the pH range of 6–7, while LSBBC in the range of pH 4–7. All the enzymes show activities on p‐nitrophenyl esters (butyrate, laurate and palmitate). LWB stood out either on the hydrolysis of sunflower oil, presenting 66.1% of the activity over commercial lipase and on the esterification of oleic acid and ethanol, surpassing the activities of the commercial lipases studied. The thin layer chromatography showed that LWB and LSB have produced ethyl esters from corn oil, while LWB produced it from sunflower oil.     

Production of fungal lipases using wheat bran and soybean bran and incorporation of sugarcane bagasse as a co-substrate in solid-state fermentation

Fungal strains were screened for lipase producing activities and 10 strains were classified as good producers. Aspergillus sp., Fusarium sp., and Penicillium sp. exhibited the highest activities when fermented in wheat bran (WB) and soybean bran (SB). No fungal growth was observed using sugarcane bagasse (CB). An experimental design was applied to incorporate CB into the fermentation process for lipase production by Aspergillus sp. and Penicillium sp., and to evaluate the best moisture content for the substrate. Strains studied achieved maximum lipase activities with 25% CB combined with 75% WB or SB at 40% moisture content. The highest lipase activities were observed for WB and SB, and for SB combined with CB using Aspergillus sp. Fermentation of 96 h was the optimum period for enzyme production.     

Thermal stability of nickel structure obtained by high-pressure torsion in liquid nitrogen

Using transmission electron microscopy and durometry, the structural evolution of commercially pure nickel (99.6%) under high-pressure torsion (HPT) in liquid nitrogen and subsequent annealings in the temperature range 100–400°C has been investigated. In this nickel, at cryogenic temperature, HPT gives rise to a nanocrystalline structure with the record high microhardness (6200 MPa) and average crystallite size ～80 nm. The obtained structure is stable at room temperature and possesses a relatively low thermal stability, since recrystallization occurs at lower temperatures than after conventional deformation or HPT at room temperature.     

Structure of a titanium-alloyed high-tin bronze obtained by the Osprey method

The titanium-alloyed bronzes with enhanced (14.5 and 15.5 wt %) tin content obtained by the Osprey method have been studied by the methods of optical, scanning, and transmission electron microscopy with the use of quantitative microanalysis in the initial state and after hot extrusion. These alloys have been employed as bronze matrices of multifilamentary superconducting Nb/Cu-Sn composites. An increase in the tin content in the bronze matrix makes it possible to enhance the critical current density of the multifilamentary composite owing to the improvement of the structure and composition of a superconducting Nb₃Sn compound that is formed upon diffusion annealing. It has been shown that the Osprey technology allows one to obtain bronzes with an enhanced Sn content and simultaneously to reduce the dendritic segregation characteristic of cast bronzes. The distribution of Sn and Ti in these alloys has been investigated. A more homogeneous structure in the initial state is characteristic of the alloy Cu-14.5Sn-0.24Ti (wt %). The increase in the tin content to 15.5 wt % leads to the formation of microregions of dendritic segregation with an (α + δ) eutectoid in the initial state, which slightly decreases plastic characteristics of this bronze.     

Chain flexibility versus molecular entanglement response to rubbing deformation in designing poly(oxadiazole-naphthylimide)s as liquid crystal orientation layers

Four poly(oxadiazole-imide)s containing naphthalene rings, with different flexibility and molecular weight, are investigated with respect to their rheological properties to establish the optimal processing conditions from solution phase to film state for liquid crystal orientation purposes. The film uniformity and strength are determined by monitoring the flow behavior and chain entanglements. The solution rheological data are in agreement with film tensile testing, revealing that higher molecular weight favors chain entanglements and implicitly the film mechanical resistance. In order to analyze the suitability of these films as alignment layers their surface is patterned by rubbing with two types of velvet. Liquid crystal alignment of 4′-pentyl-4-biphenylcarbonitrile nematic is tested by polarized light microscopy. The resulting behavior is correlated with the polyimide malleability and characteristics of the textile fibers, namely their polarity, size, and mechanical features. The competitive effects between chain flexibility and entanglements, together with the interactions occurring between the polymer and velvet are analyzed in order to explain the surface regularity, which influences the uniformity of the liquid crystal alignment. The contrast between dark and bright states recorded on the liquid crystal cell indicates that some of these polynaphthalimides are promising candidates for liquid crystal display devices.