Asymmetric synthesis XXVII: Asymmetric catalytic trimethylsilylcyanation of aldehydes by novel Ti-chiral Schiff base complexes

Enantioselective catalytic trimethylsilylcyanations of aldehydes with 48% to 92% e.e. have been studied using the novel Ti-chiral Schiff base complexes. We have found that the catalyst led to high enantoselectivity when the molar ratio of the Schiff base 1 to Ti(O-i-Pr)₄ was 2:1.     

韧性金属裂纹尖端损伤区内应变场测量——数字散斑相关法应用

本文用数字散斑相关方法测量了五种不同幂硬化指数韧性金属材料(铝和铜),双边裂纹尖端细观区域内应变场.对所得结果用韧性损伤模型进行了分析.在此法中以金属自然表面结构为散斑场,不同加载状态的散斑场进行比较,得到相对变形与应变.图象之间相关性 C 是变形参数或是位移及其导数的泛函.使其相关性 C 取最大值的试凑变形即为其真实变形场.这一方法在细观测量中应用得到满意的结果.     

MnBiDy(Sm)永磁膜的结构和磁性

报道了采用真空蒸镀的方法制备的MnBiDy(Sm)永磁膜的结构和磁性.Mn:Bi:Dy(Sm)的投料比为2:1:0.10.薄膜经过退出处理(350—425℃,保温4h)后,具有NiAs型hcp结构,C轴垂直膜面,剩余磁感应强度B=3.4-6.5kG,内禀矫顽力_MH_c≈3-8kOe,最大磁能积(BH)_(max)=13.39MG·Oe.实验发现,薄膜厚度对MnBiDy(Sm)永磁膜的结构和磁性具有很大的影响. 关键词：     

Sr1-xLaxTiO3的高温高压合成及XPS研究

 利用高温高压方法合成了有稀土元素La掺杂的钙钛矿氧化物Sr_1-xLa_xTiO₃。XRD测试表明，在x≤0.5时，样品基本为单相，呈立方相；晶胞体积随x的增加而增加，在x=0.4时开始减小。XPS测量发现，样品中存在Ti离子的变价。讨论了Ti离子价态的变化对晶格参数的影响。     

荧光光度法直接测定高纯氧化钕中的痕量镨和铈

使用Ｐ－ＥＬＳ５０荧光光谱仪，在盐酸介质中，用同一激发波长激发，分别测定Ｐｒ（Ⅲ）（ｎｍ）和Ｃｅ（Ⅲ）（３５６ｎｍ）发射峰强度。     

偶氮侧基聚合物光致异构动力学研究

本文对偶氮侧基聚合物相位共轭光时间特性进行了研究,得到了相位共扼光产生机制─光致异构过程的时间常数.在相位共轭光上升阶段,其时间常数在0.4～0.5s之间,在相让共轭光的衰减过程,衰减满足双指数关系,分段拟合得到较好的结果,且得到快过程的时间常数为0.27s,慢过程的时间常数为0.78s.     

On Decomposition Theorems for Hardy Spaces on Domains in ℂn and Applications

Hardy spaces of analytic functions are studied both on strongly pseudoconvex domains in ℂⁿ and on domains of finite type in ℂ². Duality theorems, atomic decompositions, and factorization of functions are treated. Mapping properties of certain Hankel operators are studied.     

Molecular deposition film of porphyrin and phthalocyanine bearing oppositely charged substituents

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An Estimate of Inequality of Signature and Nullity for Links

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A Novel Method to Synthesize Polyorganozircosilazane

A new kind of polyorganozircosilazane as Si/Zr/C/N-based ceramic precursor was synthesized from the condensation reaction of hexamethyleyclotrisilazane lithium salts(D3^NLi）and zirconium tetrachloride(ZrCl4).In the presence of N,N,N’,N’-tetramethyl ethylene diamine(TMEDA),polyorganozircosilazane was obtained in high yield.